Conductive member and touch panel

ABSTRACT

A first electrode on a first surface of a transparent insulating member has a first detection electrode portion having a first mesh pattern and a dummy pattern portion in the first electrode arranged so as to be insulated from the first detection electrode portion in a first mesh cell constituting the first mesh pattern, a second electrode on a second surface of the transparent insulating member has a second detection electrode portion having a second mesh pattern and a dummy pattern portion in the second electrode arranged so as to be insulated from a second detection electrode portion in a second mesh cell constituting the second mesh pattern, and a third mesh pattern is formed by combining the first detection electrode portion, the dummy pattern portion in the first electrode, the second detection electrode portion, and the dummy pattern portion in the second electrode.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a Continuation of PCT International Application No.PCT/JP2018/1097, filed on Jan. 17, 2018, which claims priority under 35U.S.C. § 119(a) to Japanese Patent Application No. 2017-042090, filed onMar. 6, 2017. Each of the above application(s) is hereby expresslyincorporated by reference, in its entirety, into the presentapplication.

BACKGROUND OF THE INVENTION 1. Field of the Invention

The present invention relates to a conductive member and particularlyrelates to a conductive member used as a touch panel.

The present invention also relates to a touch panel using a conductivemember.

2. Description of the Related Art

In recent years, in various electronic devices including portableinformation devices such as tablet computers and smart phones, a touchpanel which is used in combination with display devices such as liquidcrystal display devices and which performs an input operation on anelectronic device by causing members having tips thinner than those offingers such as fingers and stylus pens to be in contact with or beclose to a screen is in widespread.

In the touch panel, a conductive member in which a detection portion fordetecting a touch operation by causing members having tips thinner thanthose of fingers such as fingers and stylus pens to be in contact withor be close to a transparent substrate is formed is used.

The detection portion is formed of a transparent conductive oxide suchas Indium Tin Oxide (ITO), but is also formed of metal other than thetransparent conductive oxide. Metal has advantages such as easypatterning, superior bending properties, and lower resistance comparedto the above transparent conductive oxides, and thus metal such ascopper or silver is used for conductive thin wires for the touch panels.

WO2015/060059A discloses a touch panel using metal fine wires. A touchpanel of WO2015/060059A is an electrostatic capacitance sensor having afirst conductive member formed of a plurality of first electrodepatterns on a first substrate and a second conductive member formed of aplurality of second electrode patterns on a second substrate. The firstelectrode pattern and the second electrode pattern are respectivelyconstituted by a plurality of cells having a substantially rhombic shapeand are arranged along one direction on the first conductive member andthe second conductive member. The first conductive member is layered onthe second conductive member such that the plurality of first electrodepatterns and the plurality of second electrode patterns are arrangedalong directions different from each other.

SUMMARY OF THE INVENTION

In a touch panel using a mesh pattern formed of such thin metal wires,in a case where a mesh pitch is set to a small value, parasiticcapacitance of an electrode increases, and as a result, detectionsensitivity of a touch position is lowered.

Meanwhile, in a case where the mesh pitch of the metal thin wires isincreased in order to improve the detection sensitivity, a problemoccurs in that a distance between the adjacent metal thin wiresincreases, the metal thin wires become more noticeable, and thevisibility decreases. In a case where the mesh pitch of the thin metalwire is increased, a problem occurs in that moire caused by interferencebetween a periodic thin pixel pattern of a display device used incombination with the touch panel and the thin metal wires becomesnoticeable.

The present invention has been conceived in order to solve such problemsin the related art, and has an object of providing a conductive membercapable of improving the visibility and suppressing the generation ofmoire, even in a case where a detection electrode portion having awide-pitch mesh pattern with a small parasitic capacitance and highdetection sensitivity is used.

The present invention has another object of providing a touch panelcomprising such a conductive member.

The conductive member according to the present invention is a conductivemember having a transmissive region, comprising: a transparentinsulating member; a plurality of first electrodes each of which extendin a first direction and which are arranged in juxtaposition in a seconddirection orthogonal to the first direction; and a plurality of secondelectrodes each of which extend in the second direction and which arearranged in juxtaposition in the first direction, in which the pluralityof first electrodes and the plurality of second electrodes are opposedto each other with the transparent insulating member interposedtherebetween, the first electrode has a first detection electrodeportion having a first mesh pattern constituted by electricallyconnecting a plurality of first mesh cells formed of metal fine wiresand a dummy pattern portion in the first electrode which is formed ofmetal fine wires arranged inside the first mesh cell of the first meshpattern so as to be insulated from the first detection electrodeportion, the second electrode has a second detection electrode portionhaving a second mesh pattern constituted by electrically connecting aplurality of second mesh cells formed of metal fine wires and a dummypattern portion in the second electrode which is formed of metal finewires arranged inside the second mesh cell of the second mesh pattern soas to be insulated from the second detection electrode portion, and in aregion in which the first electrode and the second electrode areoverlapped with each other, a third mesh pattern is constituted by aplurality of third mesh cells formed by combining the first detectionelectrode portion, the dumm^(y) pattern portion in the first electrode,the second detection electrode portion, and the dummy pattern portion inthe second electrode.

It is preferable that the first mesh pattern has a first mesh pitchdetermined by an average value of distances in the first directionbetween centers of gravity of the first mesh cells adjacent to eachother in the first direction, the second mesh pattern has a second meshpitch determined by an average value of distances in the first directionbetween centers of gravity of the second mesh cells adjacent to eachother in the first direction, the metal fine wires of the first meshpattern and the metal fine wires of the second mesh pattern are arrangedso as to be overlapped with each other in a point shape, the third meshpattern has a third mesh pitch determined by an average value ofdistances in the first direction between centers of gravity of the thirdmesh cells adjacent to each other in the first direction, and the thirdmesh pitch is ¼ or less of the first mesh pitch and ¼ or less of thesecond mesh pitch.

It is preferable that each of the first mesh cell, the second mesh cell,and the third mesh cell each has a polygonal shape.

It is preferable that the first mesh pattern and the second mesh patternare arranged such that centers of gravity of the first mesh cells andpeaks of the second mesh cells are at positions different from eachother.

It is preferable that the first mesh pattern and the second mesh patternare arranged such that centers of gravity of the first mesh cells andcenters of gravity of the second mesh cells are at positions differentfrom each other.

It is preferable that the first mesh pattern and the second mesh patternare arranged such that peaks of the first mesh cells and centers ofgravity of the second mesh cells are at positions different from eachother.

It is preferable that the first mesh pitch and the second mesh pitch are500 μm or more.

The first mesh pitch and the second mesh pitch may be identical to eachother.

It is preferable that each of the first mesh cell, the second mesh cell,and the third mesh cell each has a quadrangular shape.

It is preferable that the first mesh pattern is constituted by theplurality of first mesh cells having the same shape, the second meshpattern is constituted by the plurality of second mesh cells having thesame shape, the third mesh pattern is constituted by the plurality ofthird mesh cells having the same shape, and the quadrangular shape is arhombus.

It is preferable that the first mesh cell and the second mesh cell havethe same shape.

A length of a side of the third mesh cell may have an irregular value of−10% to +10% with respect to an average value of lengths of sides of theplurality of third mesh cells constituting the third mesh pattern.

It is preferable that the first mesh pattern and the second mesh patternhas a gap of 150 μm or more between each end portion of the metal finewire forming the dummy pattern portion in the electrode and each metalfine wire forming the mesh cell.

It is preferable that the first mesh pattern and the second mesh patternhas a gap of ¼ or more of a length of any one side of each mesh cell,between each end portion of the metal fine wire forming the dummypattern portion in the electrode and each metal fine wire forming themesh cell.

It is preferable that the dummy pattern portion in the first electrodeand the dummy pattern portion in the second electrode do not includemetal fine wire intersect to each other in a cross shape.

A touch panel according to the embodiment of the present invention is atouch panel using the conductive member.

According to the present invention, a first electrode arranged on afirst surface of a transparent insulating substrate has a firstdetection electrode portion having a first mesh pattern and a dummypattern portion in the first electrode that is insulated from the firstdetection electrode portion and arranged inside the first mesh cell ofthe first mesh pattern, a second electrode arranged on a second surfaceof a transparent insulating substrate has a second detection electrodeportion having a second mesh pattern and a dummy pattern portion in thesecond electrode that is insulated from the second detection electrodeportion and arranged inside the second mesh cell of the second meshpattern, and a third mesh pattern is formed by combining the firstdetection electrode portion, the dummy pattern portion in the firstelectrode, the second detection electrode portion, and the dummy patternportion in the second electrode. Therefore, even in a case where adetection electrode portion having a wide pitch mesh pattern with asmall parasitic capacitance and high detection sensitivity is used, thevisibility is improved, and also it is possible to suppress thegeneration of the moire in a case where a touch panel and a displaydevice are combined with each other.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a partial cross sectional view illustrating a touch panel inwhich a conductive member according to Embodiment 1 of the presentinvention is used.

FIG. 2 is a plan view illustrating a conductive member according toEmbodiment 1.

FIG. 3 is a partial plan view illustrating only a first electrode in anelectrode intersection portion of the conductive member according toEmbodiment 1 seen from viewing side.

FIG. 4 is a plan view illustrating only a dummy pattern portion in thefirst electrode arranged inside each mesh cell of a first mesh patternof the first electrode according to Embodiment 1 seen from viewing side.

FIG. 5 is a partial enlarged plan view illustrating metal fine wiresforming the first detection electrode portion of the first electrode andmetal fine wires forming the dummy pattern portion in the firstelectrode.

FIG. 6 is a partial plan view of only a second electrode in theelectrode intersection portion of the conductive member according toEmbodiment 1 seen from viewing side.

FIG. 7 is a plan view of a dummy pattern portion in the second electrodearranged inside each mesh cell of a second mesh pattern of the secondelectrode in Embodiment 1 seen from viewing side.

FIG. 8 is a partial enlarged plan view illustrating metal fine wiresforming a second detection electrode portion of the second electrode andmetal fine wires forming a dummy pattern portion in the secondelectrode.

FIG. 9 is a partial plan view illustrating a third mesh pattern formedof the first electrode and the second electrode in the electrodeintersection portion of the conductive member according to Embodiment 1seen from viewing side.

FIG. 10 is a partial plan view illustrating only a first electrode in anelectrode intersection portion of a conductive member according toEmbodiment 2 seen from viewing side.

FIG. 11 is a plan view illustrating only a dummy pattern portion in thefirst electrode arranged inside each mesh cell of a first mesh patternof the first electrode according to Embodiment 2 seen from viewing side.

FIG. 12 is a partial plan view illustrating only a second electrode inthe electrode intersection portion of the conductive member according toEmbodiment 2 seen from viewing side.

FIG. 13 is a plan view illustrating a dummy pattern portion in thesecond electrode arranged inside each mesh cell of a second mesh patternof the second electrode in Embodiment 2 seen from viewing side.

FIG. 14 is a partial plan view illustrating a third mesh pattern formedof the first electrode and the second electrode in the electrodeintersection portion of the conductive member according to Embodiment 2seen from viewing side.

FIG. 15 is a partial plan view illustrating only a first electrode in anelectrode intersection portion of a conductive member according toEmbodiment 3 seen from viewing side.

FIG. 16 is a plan view illustrating only a dummy pattern portion in thefirst electrode arranged inside each mesh cell of a first mesh patternof the first electrode according to Embodiment 3 seen from viewing side.

FIG. 17 is a partial plan view illustrating only a second electrode inthe electrode intersection portion of the conductive member according toEmbodiment 3 seen from viewing side.

FIG. 18 is a plan view illustrating a dummy pattern portion in thesecond electrode arranged inside each mesh cell of a second mesh patternof the second electrode in Embodiment 3 seen from viewing side.

FIG. 19 is a partial plan view illustrating a third mesh pattern formedof the first electrode and the second electrode in the electrodeintersection portion of the conductive member according to Embodiment 3seen from viewing side.

FIG. 20 is a plan view illustrating a first electrode and a first dummyelectrode in an electrode intersection portion of a conductive memberaccording to Embodiment 4 seen from viewing side.

FIG. 21 is a plan view illustrating a second electrode and a seconddummy electrode in the electrode intersection portion of the conductivemember according to Embodiment 4 seen from viewing side.

FIG. 22 is a partial plan view illustrating a third mesh pattern formedof the first electrode and the second electrode in the electrodeintersection portion of the conductive member according to Embodiment 4seen from viewing side.

FIG. 23 is a partial plan view of only a first electrode in an electrodeintersection portion of the conductive member according to ComparativeExample 1 seen from viewing side.

FIG. 24 is a partial plan view illustrating only a second electrode inthe electrode intersection portion of the conductive member according toComparative Example 1 seen from viewing side.

FIG. 25 is a partial plan view illustrating a third mesh pattern formedof the first electrode and the second electrode in the electrodeintersection portion of the conductive member according to ComparativeExample 1 seen from viewing side.

FIG. 26 is a partial plan view of only a first electrode in an electrodeintersection portion of the conductive member according to ComparativeExample 2 seen from viewing side.

FIG. 27 is a partial plan view illustrating only a second electrode inthe electrode intersection portion of the conductive member according toComparative Example 2 seen from viewing side.

FIG. 28 is a partial plan view illustrating a third mesh pattern formedof the first electrode and the second electrode in the electrodeintersection portion of the conductive member according to ComparativeExample 2 seen from viewing side.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

Hereinafter, a conductive member and a touch panel according to theembodiment of the present invention are specifically described based onpreferred embodiments illustrated in the accompanying drawings.

Hereinafter, the expression “to” exhibiting a numerical value rangeincludes numerical values indicated on both sides. For example, “s is anumerical value t1 to a numerical value t2” means that the range of s isa range including the numerical value t1 and the numerical value t2, andin a case of indicating by using mathematical symbols, t1≤s≤t2.

Unless otherwise described, an angle including “orthogonal”, “parallel”,and the like includes generally accepted error ranges in the art.

“Transparent” means that the light transmittance is at least 40% ormore, preferably 75% or more, more preferably 80% or more, and even morepreferably 90% or more with respect to the visible light wavelengthrange of 400 to 800 nm. The light transmittance is measured by using“plastic—a method of obtaining total light transmittance and total lightreflectance” regulated in JIS K 7375:2008.

Embodiment 1

FIG. 1 illustrates a configuration of a touch panel 2 in which aconductive member 1 according to Embodiment 1 of the present inventionis used.

The touch panel 2 has a front surface 2A and a back surface 2B, and isused in a state in which a display device (not illustrated) such as aliquid crystal display device is arranged on the back surface 2B side.The front surface 2A of the touch panel 2 is a touch detection surface,and becomes a viewing side on which an operator of the touch panel 2observes an image of the display device through the touch panel 2.

The touch panel 2 has a transparent insulating cover panel 3 having aflat plate shape, which is arranged on the front surface 2A, and theconductive member 1 is bonded to a surface of the cover panel 3 oppositeto the front surface 2A via a transparent adhesive 4.

In the conductive member 1, metal fine wires 6A and metal fine wires 6Bare respectively formed on both surfaces of a transparent insulatingsubstrate 5 which is a transparent insulating member. That is, in theconductive member 1, a plurality of first electrodes 11 formed of themetal fine wires 6A and a plurality of second electrodes 21 formed ofthe metal fine wires 6B are arranged to face with each other in aninsulation state.

The transparent insulating substrate 5 has a first surface 5A that facesthe front surface 2A side of the touch panel 2 and a second surface 5Bthat faces the back surface 2B side of the touch panel 2, and the metalfine wires 6A is formed on the first surface 5A, and the metal finewires 6B are formed on the second surface 5B. As illustrated in FIG. 1,for the purpose of flattening or protecting the flattened metal finewires 6A and the metal fine wires 6B, so as to cover the metal finewires 6A and the metal fine wires 6B, transparent protective layers 7Aand 7B are respectively arranged on the first surface 5A and the secondsurface 5B of the transparent insulating substrate 5.

As illustrated in FIG. 2, in the conductive member 1, a transmissiveregion S1 is partitioned, and an edge part region S2 is partitioned onthe outside of the transmissive region S1.

The plurality of first electrodes 11 which are constituted by the metalfine wires 6A, respectively extend along a first direction D1, and arearranged in juxtaposition with a second direction D2 orthogonal to thefirst direction D1 are formed on the first surface 5A of the transparentinsulating substrate 5, and the plurality of second electrodes 21 whichare constituted by the metal fine wires 6B, respectively extend alongthe second direction D2, and are arranged in juxtaposition with thefirst direction D1 are formed on the second surface 5B of thetransparent insulating substrate 5. In this manner, the plurality offirst electrodes 11 and the plurality of second electrodes 21 arearranged via the transparent insulating substrate 5.

The first electrodes 11 formed on the first surface 5A (viewing side) ofthe transparent insulating substrate 5 and the second electrodes 21formed on the second surface 5B (display device side) of the transparentinsulating substrate 5 are arranged on the transmissive region S1 so asto intersect with each other in plan view in an overlapping manner.

Meanwhile, a plurality of first edge part wires 12 connected to theplurality of first electrodes 11 are formed on the first surface 5A ofthe transparent insulating substrate 5 in the edge part region S2. Aplurality of first external connection terminals 13 are formed in anarray in an edge portion of the transparent insulating substrate 5, andthe first connector portions 14 are formed on end portions of the firstelectrodes 11. One end portions of the corresponding first edge partwires 12 are connected to first connector portions 14, and the other endportions of the first edge part wires 12 are connected to thecorresponding first external connection terminals 13. Here, in the firstelectrodes 11, a first connector portion may be formed also in the otherend portion to which the first edge part wire 12 is not connected. Thefirst connector portion formed in the other end portion of the firstelectrode 11 can be used as a terminal that connects the first edge partwires 12 and can be used as a terminal for a continuity test of thefirst electrode 11.

In the same manner, a plurality of second edge part wires 22 that areconnected to the plurality of second electrodes 21 are formed on thesecond surface 5B of the transparent insulating substrate 5 in the edgepart region S2. The plurality of second external connection terminals 23are formed in an array in the edge portion of the transparent insulatingsubstrate 5, and second connector portions 24 are respectively formed inthe end portions of the second electrodes 21. One end portions of thecorresponding second edge part wires 22 are connected to the secondconnector portions 24, and the other end portions of the second edgepart wires 22 are connected to the corresponding second externalconnection terminals 23. Here, in the second electrode 21, a secondconnector portion may be also formed in the other end portion to whichthe second edge part wire 22 is not connected. The second connectorportion formed in the other end portion of the second electrode 21 canbe used as a terminal for connecting the second edge part wire 22 or canbe used as a terminal for a continuity test of the second electrodes 21.

FIG. 3 illustrates a partial plan view of only the first electrode 11 ina region R0 in an electrode intersection portion, in which the firstelectrodes 11 and the second electrodes 21 are overlapped with eachother, seen from viewing side. The region R0 in the electrodeintersection portion is a region in which, in a case where theconductive member 1 is seen in a direction orthogonal to the firstdirection D1 and the second direction D2, the first electrodes 11 andthe second electrodes 21 are overlapped with each other.

The first electrode 11 has first detection electrode portions 11A whichare drawn by relatively thick lines in FIG. 3 and dummy pattern portions11B in the first electrode which are drawn by relatively thin lines inFIG. 3. The first detection electrode portions 11A and the dummy patternportions 11B in the first electrode are respectively formed of metalfine wires M1A and metal fine wires M1B, and the dummy pattern portions11B in the first electrode are arranged so as to be not electricallyconnected to the first detection electrode portions 11A and be insulatedfrom the first detection electrode portions 11A.

The first detection electrode portion 11A forms a first mesh patternMP1. The first mesh pattern MP1 is a mesh pattern having a first meshpitch PA1 which is formed by using rhombic first mesh cells C1 asconstitutional units and electrically connecting the plurality of firstmesh cells C1. Here, the first mesh pitch PA1 is defined as an averagevalue of a distance P1 in the first direction D1 between centers ofgravity of the first mesh cells C1 adjacent to each other in the firstdirection D1. As illustrated in FIG. 3, in a case where the first meshpattern MP1 is a pattern constituted by the first mesh cells C1 havingthe same shape. PA1=P1. In view of decreasing a parasitic capacitance ofthe first detection electrode portion 11A and improving the sensitivityof a touch panel, the first mesh pitch PA1 is preferably 500 μm or more.

As illustrated in FIG. 4, the dummy pattern portions 11B in the firstelectrode having at least one first dummy unit pattern T1B are arrangedinside of the first mesh cells C1 of the first mesh pattern MP1. Thefirst dummy unit pattern T1B is a pattern which forms the dummy patternportions 11B in the first electrode and in which the plurality of metalfine wires M1B not having intersection are arranged so as to be spacedfrom each other, that is, a pattern that does not include the metal finewires M1B that intersect with each other in a cross shape. Asillustrated in FIG. 3, the dummy pattern portions 11B in the firstelectrode are preferably arranged inside all of the first mesh cells C1.

As illustrated in FIG. 5, in order to secure visibility, it is desirablethat a line width W1A of the metal fine wires M1A that form the firstdetection electrode portions 11A and a line width W1B of the metal finewires M1B that form the dummy pattern portions 11B in the firstelectrode is set, for example, in the range of 0.5 μm to 5 μm. In thepresent specification, the expression “to secure visibility” means that,in a case where the conductive member 1 is used in the touch panel 2illustrated in FIG. 1, the presence of the metal fine wires M1A and M1Bis not observed with bare eyes, and an image of a display device (notillustrated) is clearly checked through the conductive member 1.

The line width W1A of the metal fine wires M1A that form the firstdetection electrode portions 11A and the line width W1B of the metalfine wires M1B that form the dummy pattern portions 11B in the firstelectrode are preferably the same value with each other, but may bedifferent from each other.

In FIG. 3, there are a plurality of false intersection points that areseen as the metal fine wires M1A that form the first detection electrodeportions 11A and the metal fine wires M1B that form the dummy patternportions 11B in the first electrode intersect with each other, but, asillustrated in FIGS. 4 and 5, even in the false intersection points, inorder to secure insulating properties, the metal fine wires M1A and themetal fine wires M1B are spaced from each other to have first gaps G1Aand are not in contact with each other. Therefore, the metal fine wiresM1A that form the first detection electrode portions 11A and the metalfine wires M1B that form the dummy pattern portions 11B in the firstelectrode are formed on the same surface (the first surface 5A) of thetransparent insulating substrate 5 but are in a state of beingelectrically insulated from each other. As illustrated in FIG. 4, thefirst electrode 11 has a portion in which the metal fine wire M1A andthe metal fine wire M1B are spaced from each other by a second gap G1Bthat is longer than the first gap G1A. The first gap G1A between themetal fine wire M1A and the metal fine wire M1B preferably has a lengthof 0.5 μm or more and more preferably has a length of 5 μm to 25 μm.Otherwise, the first gap G1A preferably has a length of 1/2,000 or moreof a length of one side of the first mesh cell C1 and more preferablyhas a length of 1/200 to 1/40. Here, the length of the first gap G1A isdefined by a distance of a line extending the metal fine wire M1B thatform the dummy pattern portion 11B in the first electrode in a straightline shape from an end portion of the metal fine wire M1B to anintersection with the metal fine wire M1A that forms the first detectionelectrode portions 11A. The second gap G1B preferably has a length of100 μm or more and more preferably has a length of 150 μm or more.Otherwise, the second gap G1B preferably has a length of 1/10 or more ofa length of one side of the first mesh cell C1, more preferably has alength of ⅕ or more, and even more preferably has a length of ¼ or more.In this manner, in a case where the second gap G1B has a length of 150μm or more, it is possible to secure further insulating propertiesbetween the first detection electrode portion 11A and the dummy patternportion 11B in the first electrode and improve detection sensitivity ina case where the conductive member 1 is used in the touch panel 2. Thelength of the second gap G1B is defined by the same length as the firstgap G1A.

FIG. 6 illustrates a partial plan view in which only the secondelectrode 21 in the region R0 in the electrode intersection portion inwhich the first electrode 11 and the second electrode 21 are overlappedwith each other is seen from a viewing side.

The second electrode 21 has second detection electrode portions 21Adrawn by relatively thick broken lines in FIG. 6 and dummy patternportions 21B in the second electrode drawn by relatively thin brokenlines in FIG. 6. The second detection electrode portions 21A and thedummy pattern portions 21B in the second electrode are respectivelyformed of metal fine wires M2A and metal fine wires M2B, and the dummypattern portions 21B in the second electrode are arranged so as be notelectrically connected to the second detection electrode portions 21Aand be insulated from the second detection electrode portions 21A.

The second detection electrode portions 21A form a second mesh patternMP2. In the same manner as the first mesh pattern MP1, the second meshpattern MP2 is a mesh pattern having a second mesh pitch PA2 which isformed by using rhombic second mesh cells C2 as constitutional units andelectrically connecting the plurality of rhombic second mesh cells C2.Here, the second mesh pitch PA2 is defined by an average value of adistance P2 between in the first direction D1 centers of gravity of thesecond mesh cells C2 that are adjacent to each other in the firstdirection D1. As illustrated in FIG. 6, in a case where the second meshpattern MP2 is a pattern constituted by the second mesh cells C2 havingthe same shape, PA2=P2 is satisfied. In view of decreasing a parasiticcapacitance of the second detection electrode portion 21A and improvingthe sensitivity of the touch panel, the second mesh pitch PA2 ispreferably 500 μm or more.

The second mesh pitch PA2 can be determined by a value different fromthe first mesh pitch PA1, but it is preferable that the second meshpitch PA2 is the same as the first mesh pitch PA1, since the detectionsensitivity of the first electrodes 11 and second electrodes 12 can becaused to be in the same level, and the detection sensitivity of thetouch panel can be homogenized, and according to the aspect, thefollowing description is made.

As illustrated in FIG. 7, the dummy pattern portions 21B in the secondelectrode having second dummy unit patterns T2B are arranged in thesecond mesh cell C2 of the second mesh pattern MP2. The second dummyunit pattern T2B is a pattern not including the metal fine wires M2Bthat intersect with each other in a cross shape. As in FIG. 6, the dummypattern portions 21B in the second electrode are preferably arrangedinside all the second mesh cell C2.

As illustrated in FIG. 8, in order to secure the visibility, it isdesirable that a line width W2A of the metal fine wire M2A that formsthe second detection electrode portion 21A and a line width W2B of themetal fine wire M2B that forms the dummy pattern portions 21B in thesecond electrode are set in the range of 0.5 μm to 5 μm.

The line width W2A of the metal fine wire M2A that forms the seconddetection electrode portion 21A and the line width W2B of the metal finewire M2B that forms the dummy pattern portions 21B in the secondelectrode are preferably the same with each other but may be differentfrom each other.

In FIG. 6, there are a plurality of false intersection points in whichthe metal fine wires M2A that form the second detection electrodeportions 21A and the metal fine wires M2B that form the dummy patternportions 21B in the second electrode are observed to intersect with eachother, but as illustrated in FIGS. 7 and 8, even in the falseintersection points, in order to secure insulating properties from eachother, the metal fine wires M2A and the metal fine wires M2B are spacedfrom each other via a first gap G2A and are not in contact with eachother. Therefore, though the metal fine wires M2A that form the seconddetection electrode portions 21A and the metal fine wires M2B that formthe dummy pattern portions 21B in the second electrode are formed on thesame surface (the second surface 5B) of the transparent insulatingsubstrate 5, but are electrically insulated from each other. Asillustrated in FIG. 7, the metal fine wires M2A and the metal fine wiresM2B have portions spaced by a second gap G2B which is longer than thefirst gap G2A. For example, the first gap G2A between the metal finewire M2A and the metal fine wire M2B preferably has a length of 0.5 μmor more and more preferably has a length of 5 μm to 25 μm. Otherwise,the first gap G2A preferably has a length of 1/2,000 or more of a lengthof one side of the second mesh cell C2 and more preferably a length of1/200 to 1/40. Here, the length of the first gap G2A is defined by adistance of a line extending the metal fine wires M2B that form thedummy pattern portions 21B in the second electrode in a straight lineshape from an end portion of the metal fine wires M2B to an intersectionwith the metal fine wires M2A that forms the second detection electrodeportions 21A. The second gap G2B preferably has a length of 100 μm ormore and more preferably has a length of 150 μm or more. Otherwise, thesecond gap G2B preferably has a length of 1/10 or more of a length ofone side of the second mesh cell C2, more preferably a length of ⅕ ormore, and even more preferably a length of ¼ or more. In this manner, bycausing the second gap G2B to have a length of 150 μm or more, it ispossible to secure further insulating properties between the seconddetection electrode portions 21A and the dummy pattern portions 21B inthe second electrode, and it is possible to improve the detectionsensitivity in a case of using the conductive member 1 in the touchpanel 2. The length of the second gap G2B can be defined by the samelength of the first gap G2A.

Here, the second mesh pattern MP2 is arranged in a position in which apeak of the first mesh cell C1 and a peak of the second mesh cell C2 aredeviated by ¼ of the first mesh pitch PA1 in the first direction D1 suchthat a center of gravity of the first mesh cell C1 and a peak of thesecond mesh cell C2 are overlapped with each other, with respect to thefirst mesh pattern MP1. Accordingly, in the region R0 in the electrodeintersection portion, in a case where the first electrodes 11 that areformed on the first surface 5A of the transparent insulating substrate 5and the second electrodes 21 that are formed on the second surface 5B ofthe transparent insulating substrate 5 are observed on the viewing side,as illustrated in FIG. 9, the first detection electrode portions 11A ofthe first electrodes 11 and the dummy pattern portions 11B in the firstelectrode, and the second detection electrode portions 21A of the secondelectrodes 21 and the dummy pattern portions 21B in the second electrodeare combined with each other, so as to form the third mesh pattern MP3constituted by rhombic third mesh cells C3. Specifically, a metal finewire that forms the first mesh pattern MP1 and a metal fine wire thatforms the second mesh pattern MP2 are arranged so as to be overlappedwith each other in a dot shape. That is, the first mesh pattern MP1 andthe second mesh pattern MP2 are not overlapped with each other in a lineshape. By causing the patterns to be arranged so as to be overlappedwith each other in a dot shape, it is possible to decrease the parasiticcapacitance in the electrode intersection portion, it is possible toimprove the detection sensitivity of the touch panel 2. That is, thesecond mesh pattern MP2 can be arranged at a position of being deviatedby a distance ΔL in the first direction D1 with respect to the firstmesh pattern MP1. Particularly, it is preferable that the patterns arearranged such that the center of gravity of the first mesh cell C1 andthe peak of the second mesh cell C2 are in different positions.According to this arrangement, the parasitic capacitance in theelectrode intersection portion can be decreased, and the detectionsensitivity of the touch panel can be improved. As illustrated in FIG.9, it is preferable that relative positions of the first mesh patternMP1 and the second mesh pattern MP2 are set such that an intervalbetween the metal fine wire that forms the second mesh pattern MP2 andthe metal fine wire that is adjacent to this metal fine wire and formsthe first mesh pattern MP1 becomes ¼ of the first mesh pitch PA1.Accordingly, since the parasitic capacitance in the electrodeintersection portion can be effectively decreased, and also thevisibility can be improved, the detection sensitivity of the touch panel2 in a case of using the conductive member 1 can be improved and thevisibility can be improved.

A third mesh pattern MP3 is a mesh pattern having a third mesh pitch PA3which is formed by using the rhombic third mesh cells C3 asconstitutional units. The third mesh cell C3 may not be a cell shapethat is completely closed and may have a structure having a gap(interval) in a portion of the cells. The length of the gap is 0.5 to 30μm.

Here, the third mesh pitch PA3 is defined by an average value of adistance P3 in the first direction D1 between centers of gravity of thethird mesh cells C3 that are adjacent to each other in the firstdirection D1. The third mesh pitch PA3 has a value of ¼ of the firstmesh pitch PA1 and the second mesh pitch PA2 of the first mesh patternMP1 and the second mesh pattern MP2. The third mesh pitch PA3 can be ¼or less of the first mesh pitch PA1 and the second mesh pitch PA2. Inthis case, the third mesh pitch PA3 is preferably ¼, ⅙, or ⅛ of thefirst mesh pitch PA1 and the second mesh pitch PA2. Particularly, inview of visibility of the metal fine wire and detection sensitivity ofthe touch panel, the third mesh pitch PA3 is preferably ¼ of the firstmesh pitch PA1 and the second mesh pitch PA2.

In this manner, the first detection electrode portions 11A of the firstelectrodes 11 formed on the first surface 5A of the transparentinsulating substrate 5 form the first mesh pattern MP1, the dummypattern portions 11B in the first electrode that are insulated from thefirst detection electrodes 11A in the first mesh cells C1 constitutingthe first mesh pattern MP are arranged, the second detection electrodeportions 21A of the second electrodes 21 formed in the second surface 5Bof the transparent insulating substrate 5 form the second mesh patternMP2, the dummy pattern portions 21B in the second electrode that areinsulated from the second detection electrode portion 21A in the secondmesh cell C2 constituting the second mesh pattern MP2 are arranged, andthe first detection electrode portions 11A of the first electrodes 11and the dummy pattern portions 11B in the first electrode are combinedwith the second detection electrode portions 21A of the secondelectrodes 21 and the dummy pattern portions 21B in the second electrodeto form the third mesh pattern MP3 constituting the third mesh cell C3.

Therefore, the first mesh pitch PA1 of the first mesh pattern MP1 thatis formed by the first detection electrode portions 11A of the firstelectrodes 11 that is used for the detection of a touch operation andthe second mesh pitch PA2 of the second mesh pattern MP2 that is formedby the second detection electrode portions 21A of the second electrodes21 can be set to be longer than the third mesh pitch PA3 of the thirdmesh pattern MP3. In Embodiment 1, the first mesh pitch PA1 and thesecond mesh pitch PA2 are as large as four times the third mesh pitchPA3.

Accordingly, in a case of being seen from the viewing side, the intervalof the adjacent metal fine wires M1A, M1B, M2A, and M2B can be narroweddown such that the presence of the metal fine wires M1A, M1B, M2A, andM2B become invisible, and the size and the angle of the third mesh cellC3 are selected to design the third mesh pattern MP3 such that thegeneration of the moire in a case of using a display device (notillustrated) in combination with the touch panel 2 is decreased.Therefore, the parasitic capacitances of the first detection electrodeportions 11A and the second detection electrode portions 21A can bereduced. In this manner, even in a case of using a detection electrodeportion having less parasitic capacitance, high detection sensitivity,and a mesh pattern with a wide pitch, for example, a wide pitch of 500μm or more, together with improving the visibility, the generation ofthe moire in a case of combining the touch panel 2 and a display devicecan be suppressed.

Though not illustrated, a configuration of having a dummy electrodeelectrically insulated from the first detection electrode portions 11Aof these first electrodes 11 in a region between the first electrodes 11adjacent to each other which are arranged in juxtaposition on the firstsurface 5A of the transparent insulating substrate 5 and having a dummyelectrode electrically insulated from the second detection electrodeportions 21A of these second electrodes 21 in the region between thesecond electrodes 21 adjacent to each other which are arranged injuxtaposition on the second surface 5B of the transparent insulatingsubstrate 5. At this point, the first electrode 11 can have adisconnected portion for insulating the first detection electrodeportion 11A and the dummy electrode, and the second electrode 21 canhave a disconnected portion for insulating the second detectionelectrode portion 21A and the dummy electrode.

The dummy electrode that is positioned between the first electrodes 11adjacent to each other is formed of a metal fine wire to have a patternby the first detection electrode portions 11A of the first electrodes 11and the dummy pattern portions 11B in the first electrode as illustratedin FIG. 3. The dummy electrode that is positioned between the pluralityof second electrodes 21 is formed of a metal fine wire having a patternby the second detection electrode portions 21A of the second electrodes21 and the dummy pattern portions 21B in the second electrode asillustrated in FIG. 6.

Each of the disconnection widths of the disconnected portion forinsulating the first detection electrodes 11A and the dummy electrodeand the disconnected portion for insulating the second detectionelectrode portion 21A and the dummy electrode is preferably 0.5 to 30μm. A disconnected portion may be further provided in the metal finewire inside the dummy electrode. For example, one or more disconnectedportions may be provided to each side of the mesh cell constituting thedummy electrode.

In a case where such a dummy electrode is formed on each of the firstsurface 5A and the second surface 5B of the transparent insulatingsubstrate 5, in a case of being seen from the viewing side, not only onthe electrode intersection portion in which the first electrodes 11 andthe second electrodes 21 are overlapped with each other, but also on theentire surface of the transmissive region S1, the third mesh pattern MP3illustrated in FIG. 9 is formed, such that the pattern appearance of thefirst electrodes 11 and the second electrodes 21 can be prevented, andalso the improvement of the visibility and the decrease of the moiregeneration can be realized.

In the above, a configuration in which the first electrodes 11 and thesecond electrodes 21 formed of metal fine wires are arranged on bothsurfaces of the transparent insulating substrate 5 illustrated in FIG. 1is described, but the present invention is not limited to theconfiguration. The present invention may have a configuration in whichthe first electrodes 11 and the second electrodes 21 are insulated fromthe transparent insulating member, may be a configuration in which twosheets of electrode substrates illustrated in FIG. 11 of JP2016-126731Aare bonded via a transparent pressures sensitive adhesive layer, or maybe a configuration in which column wires and row wires are provided on atransparent substrate via an interlayer insulation film as illustratedin FIG. 4 of JP2010-097536A. In the former case, the electrode substrateand the transparent pressure sensitive adhesive layer constitute thetransparent insulating member, and in the latter case, the interlayerinsulation film corresponds to the transparent insulating member.

Hereinafter, each member constituting the conductive member 1 isdescribed.

<Transparent Insulating Substrate>

The transparent insulating substrate 5 is not particularly limited, aslong as the transparent insulating substrate is transparent, haselectric insulation properties, and supports the first electrodes 11 andthe second electrodes 21, but as the material constituting thetransparent insulating substrate 5, for example, tempered glass, alkalifree glass, polyethylene terephthalate (PET), polyethylene naphthalate(PEN), a cyclo-olefin polymer (COP), a cyclic olefin copolymer (COC),polycarbonate (PC), an acrylic resin, polyethylene (PE), polypropylene(PP), polystyrene (PS), polyvinyl chloride (PVC), polyvinylidenechloride (PVDC), and triacetate cellulose (TAC) can be used. Thethickness of the transparent insulating substrate 5 is, for example, 20to 1,000 μm, and particularly preferably 30 to 100 μm.

The total light transmittance of the transparent insulating substrate 5is preferably 40% to 100%. The total light transmittance is measured byusing “plastic—a method of obtaining total light transmittance and totallight reflectance” regulated in JS K 7375:2008.

One of the preferred embodiments of the transparent insulating substrate5 is a treated substrate that has been subjected to at least onetreatment selected from the group consisting of an atmospheric pressureplasma treatment, a corona discharge treatment, and an ultravioletirradiation treatment. By performing the above treatment, a hydrophilicgroup such as an OH group is introduced to the front surface of thetreated transparent insulating substrate 5, and adhesiveness between thefirst electrodes 11 and the second electrodes 21 is improved. Among theabove treatments, in view of improving the adhesiveness between thefirst electrodes 11 and the second electrodes 21, an atmosphericpressure plasma treatment is preferable.

Another preferred aspect of the transparent insulating substrate 5preferably has undercoat layers including polymers on the first surface5A on which the first electrodes 11 are formed and the second surface 5Bon which the second electrodes 21 are formed. In a case wherephotosensitive layers for forming the first electrode 11 and the secondelectrode 21 are formed on this undercoat layer, adhesiveness betweenthe first electrode 11 and the first surface 5A and between the secondelectrode 21 and the second surface 5B are further improved.

The method of forming the undercoat layer is not particularly limited,but examples thereof include a method of coating a substrate with acomposition for forming an undercoat layer including a polymer, andperforming a heat treatment, if necessary. The composition for formingan undercoat layer may include a solvent, if necessary. The types of thesolvent are not particularly limited, but examples thereof include asolvent used in the composition for forming a photosensitive layerdescribed below. A latex including polymer fine particles as thecomposition for forming an undercoat layer including a polymer may beused. The refractive index of the undercoat layer may be adjusted so asto use the undercoat layver as a refractive index adjusting layer fordecreasing the reflection of the transparent insulating substrate 5.

The thickness of the undercoat layer is not particularly limited, but inview of causing the adhesiveness of the first electrode 11 and thesecond electrode 21 with the transparent insulating substrate 5 to beexcellent, the thickness is preferably 0.02 to 0.3 μm and morepreferably 0.03 to 0.2 μm.

If necessary, the conductive member 1 may include an antihalation layerin addition to the above undercoat layer, as another layer between thetransparent insulating substrate 5 and the first electrode 11 and thesecond electrode 21.

<Metal Fine Wire>

With reference to FIGS. 5 and 8, as described above, in order to securevisibility, it is desirable that the metal fine wire M1A that forms thefirst detection electrode portion 11A of the first electrode 11, themetal fine wire M1B that forms the dummy pattern portions 11B in thefirst electrode, the metal fine wire M2A that forms the second detectionelectrode portion 21A of the second electrode 21, and the metal finewire M2B that forms the dummy pattern portions 21B in the secondelectrode, for example, have a line width set in the range of 0.5 to 5μm. In a case where the metal fine wires M1A, M1B, M2A, and M2B havesuch a line width, the first detection electrode portions 11A and thesecond detection electrode portions 21A which have low resistances canbe comparatively easily formed.

The thicknesses of the metal fine wires M1A, M1B, M2A, and M2B are notparticularly limited, but the thickness is preferably 0.01 to 200 μm,more preferably 30 μm or less, even more preferably 20 μm or less,particularly preferably 0.01 to 9 μm, and most preferably 0.05 to 5 μm.Accordingly, the resistance reduction of the first detection electrodeportion 11A and the second detection electrode portion 21A andimprovement of the durability of the first detection electrode portions11A, the dummy pattern portions 11B in the first electrode, the seconddetection electrode portions 21A, and the dummy pattern portions 21B inthe second electrode can be comparatively easily realized.

The metal fine wires M1A, M1B, M2A, and M2B use metal or alloy as aforming material and can be formed of, for example, copper, aluminum, orsilver. It is preferable that the metal fine wires M1A, M1B, M2A, andM2B include metallic silver, but may include metals other than metallicsilver such as gold and copper. It is preferable that the metal finewires M1A, M1B, M2A, and M2B include metallic silver, gelatin, and apolymer binder such as an acry⋅-styrene-based latex, which are suitablefor forming a mesh pattern. As the materials of the metal fine wiresM1A, M1B, M2A, and M2B, metal such as copper, aluminum, silver,molybdenum, or titanium, or an alloy containing these is preferablyused. The metal fine wires M1A, M1B, M2A, and M2B may have a laminationlayer structure of these metal materials, for example, a metal fine wirehaving a lamination layer structure of molybdenum/aluminum/molybdenum ora metal fine wire having a lamination layer structure ofmolybdenum/copper/molybdenum can be used.

For example, the metal fine wires M1A, M1B, M2A, and M2B may includemetal oxide particles, a metal paste such as a silver paste and a copperpaste, and metal nanowire particles such as silver nanowires and coppernanowires.

In order to improve the visibility of the metal fine wires M1A, M1B,M2A, and M2B, a blackening layer may be formed at least on the viewingside surface of the metal fine wires M1A, M1B, M2A, and M2B. As theblackening layer, metal oxide, metal nitride, metal oxynitrides, andmetal sulfide and the like are used, and typically, copper oxynitride,copper nitride, copper oxide, molybdenum oxide, and the like can beused.

The sizes of the first mesh pitch PA1 of the first mesh pattern MP1 thatforms the first detection electrode portion 11A of the first electrode11 and the second mesh pitch PA2 of the second mesh pattern MP2 thatforms the second detection electrode portion 21A of the second electrode21 are not particularly limited, but in view of improving the detectionsensitivity capable of decreasing the parasitic capacitance of the firstelectrode 11 and the second electrode 21, the size is preferably 500 μmor more, more preferably 600 μm or more, and even more preferably 800 μmor more. The upper limit values of the first mesh pitch PA1 and thesecond mesh pitch PA2 is a width of the first electrode and a width ofthe second electrode and is preferably 1,600 μm or less. It ispreferable that the mesh pitch is in the range of not exceeding theupper limit value, because the conduction of the electrode as the touchpanel can be sufficiently secured. The size of the third mesh pitch PA3of the third mesh pattern MP3 that is formed by combining the firstdetection electrode portions 11A of the first electrodes 11, the dummypattern portions 11B in the first electrode, the second detectionelectrode portions 21A of the second electrodes 21, and the dummypattern portions 21B in the second electrode with each other is notparticularly limited, but in consideration of visibility, the size ispreferably 50 to 400 μm and more preferably 150 to 300 μm.

In view of suppressing the moire of the display device, the first meshcell C1 as the constitutional unit of the first mesh pattern MP1, thesecond mesh cell C2 as the constitutional unit of the second meshpattern MP2, and the third mesh cell C3 as the constitutional unit ofthe third mesh pattern MP3 are preferably quadrangular shapes andparticularly preferably rhombuses. The size of the acute angle of thisrhombus can be, for example, 20 degrees to 88 degrees. The size of theacute angle of this rhombus is preferably 30 degrees to 85 degrees andmore preferably 50 degrees to 80 degrees. The first mesh cell C1, thesecond mesh cell C2, and the third mesh cell C3 may be regular hexagons,regular triangles, and other polygons, other than rhombuses. It ispreferable that the first mesh pattern MP1, the second mesh pattern MP2,and the third mesh pattern MP3 are respectively constituted by theplurality of first mesh cells C1 having the same shape, the plurality ofsecond mesh cells C2 having the same shape, and the plurality of thirdmesh cells C3 having the same shape, because the design of the meshpatterns of the electrodes becomes easy. It is particularly preferablethat the first mesh cells C1 and the second mesh cells C2 have the sameshape, because the design of the mesh patterns of the electrodes becomeseasy.

The third mesh pattern MP3 illustrated in FIG. 9 is a regular fixedpattern in which the plurality of third mesh cells C3 having the sameshape are repeatedly arranged in the first direction D1 and the seconddirection D2, respectively, but the present invention is not limitedthereto and may be an irregular pattern formed of the irregularly shapedthird mesh cells C3.

The third mesh pattern MP3 has a polygonal shape having lengths ofirregular sides of −10% to +10%, particularly, an irregular shapeconstituted by the quadrangular third mesh cells, with respect to theaverage value of the lengths of the sides of the plurality of third meshcells C3 constituting the third mesh pattern MP3. According to thisconfiguration, it is possible to achieve both moire suppression andcolor noise reduction in a case of being combined with a display device.

In a case of calculating the average value of the lengths of the sidesof the plurality of third mesh cells C3, an average value of the lengthsof the sides with respect to the plurality of third mesh cells C3arranged in the area having the defined area can be calculated. Forexample, it is preferable to calculate the average value of the sidelength with respect to the plurality of third mesh cells C3 arranged ina region of 10 mm×10 mm.

In order to cause the third mesh pattern MP3 to be such an irregularpattern, the third mesh pattern MP3 can also be formed by using thefirst mesh pattern MP1 formed by the plurality of first mesh cells C1having irregular shapes and the second mesh pattern MP2 formed by theplurality of second mesh cells C2 having irregular shapes. In this case,the first mesh pitch PA1 of the first mesh pattern MP1 can be defined byan average value of the distance in the first direction between centersof gravity of two first mesh cells C1 adjacent to each other in thefirst direction. The second mesh pitch PA2 of the second mesh patternMP2 can be defined by the average value of the distances in the firstdirection between centers of gravity of two second mesh cells C2adjacent to each other in the first direction.

In a case of calculating the average value of the distances between thecenters of gravity of the mesh cells adjacent to each other, withrespect to the plurality of first mesh cells C1 and the plurality ofsecond mesh cells C2 arranged in the region having a predetermined area,an average value of the distances between the centers of gravity of themesh cells adjacent to each other can be calculated. For example, it ispreferable to calculate the average value of the distances between thecenters of gravity of the mesh cells adjacent to each other of theplurality of first mesh cells C1 and the plurality of second mesh cellsC2 arranged in the region of 10 mm×10 mm.

Also by causing the sizes or shapes (including angles) of the first meshcells C1 as the constitutional units of the first mesh pattern MP1 andthe second mesh cell C2 as the constitutional unit of the second meshpattern MP2 to be different from each other, it is possible toconstitute the third mesh pattern MP3 formed by the plurality of thirdmesh cells C3 having an irregular shape.

Subsequently, the method of forming the metal fine wires M1A, M1B, M2A,and M2B is described. As the method of forming these metal fine wires,for example, a plating method, a silver salt method, a vapor depositionmethod, a printing method, and the like can be suitably used.

The method of forming the metal fine wires by the plating method isdescribed. For example, the fine metal wire can be constituted by usinga metal plating film formed on the underlayer by performing electrolessplating on the electroless plating underlayer. In this case, the metalfine wires are formed by forming a pattern shape on the substrate withcatalyst ink containing at least metal fine particles, then immersingthe substrate in an electroless plating bath, and forming a metalplating film. More specifically, the method for manufacturing ametal-coated substrate disclosed in JP2014-159620A can be used. Themetal fine wires are formed by forming a pattern shape on the substratewith a resin composition having at least a functional group capable ofinteracting with a metal catalyst precursor, applying a catalyst or acatalyst precursor, immersing the substrate in an electrolessly platebath, and forming a metal plating film. More specifically, the method ofmanufacturing a metal-coated substrate disclosed in JP2012-144761A canbe applied.

The method of forming metal thin lines by the silver salt method isdescribed. First, an exposure treatment is performed on a silver halideemulsion layer including silver halide by using an exposure pattern tobe metal fine wires, and then a development treatment is performed, soas to form the fine metal wires. More specifically, methods ofmanufacturing metal fine wires disclosed in JP2012-006377A,JP2014-112512A. JP2014-209332A, JP2015-022397A, JP2016-192200A, andW02016/157585A can be used.

The method of forming metal thin wires by the vapor deposition method isdescribed. First, a copper thin layer can be formed by vapor deposition,and copper wires are formed of the copper thin layer byphotolithography, so as to form metal fine wires. In addition to thevapor deposited copper thin layer, an electrolytic copper thin layer canbe used as the copper thin layer. More specifically, a step of formingcopper wires disclosed in JP2014-029614A can be used.

The method of forming the metal thin wire by the printing method isdescribed. First, a conductive paste containing conductive powders isapplied to a substrate so as to have the same pattern as the metal thinwires, and then the heat treatment is performed, so as to form the metalthin wires. In the pattern formation by using a conductive paste, forexample, an inkjet method or a screen printing method can be used. Morespecifically, a conductive paste disclosed in JP2011-028985A can be usedas the conductive paste.

<Protective Layer>

As the transparent protective layers 7A and 7B, organic films ofgelatin, an acrylic resin, a urethane resin, or the like, and inorganicfilms of silicon dioxide or the like can be used, and the film thicknessis preferably 10 nm to 100 nm.

If necessary, a transparent coating layer may be formed on theprotective layer. As the transparent coat layer, an organic film of anacrylic resin, a urethane resin, or the like is used, and the filmthickness thereof is preferably 1 μm to 100 μm.

As a material of the cover panel 3 constituting the touch panel 2,tempered glass, polycarbonate, polyethylene terephthalate, polymethylmethacrylate resin (PMMA), or the like can be used, and the thickness ofthe cover panel 3 is preferably 0.1 to 1.5 mm. A decorative layer thatshields the edge part region S2 may be formed on the cover panel 3 to.

As the transparent adhesive 4 for bonding the conductive member 1 to thecover panel 3, an optical transparent pressures sensitive adhesive sheet(Optical Clear Adhesive: OCA) or an optical transparent pressuressensitive adhesive resin (Optical Clear Resin: OCR) can be used, and thepreferable film thickness is 10 μm to 200 μm. As the optical transparentpressures sensitive adhesive sheet, for example, 8146 seriesmanufactured by The 3M Company can be used.

<Edge Part Wire Insulating Film>

For the purpose of preventing shorting between edge part wires andcorrosion of the edge part wires, an edge part wire insulating film maybe formed on the first edge part wires 12 and the second edge part wires22 as illustrated in FIG. 2. As the edge part wire insulating film, anorganic film of an acrylic resin, a urethane resin, or the like is used,and the film thickness is preferably 1 μm to 30 μm. The edge part wireinsulating film may be formed only on one of the first edge part wires12 and the second edge part wires 22.

Embodiment 2

In Embodiment 1 described above, the dummy pattern portions 11B in thefirst electrode having the first dummy unit pattern T1B illustrated inFIG. 4 are arranged inside each mesh of the first mesh pattern MP1formed of the first detection electrode portions 11A, and the dummypattern portions 21B in the second electrode having the second dummyunit pattern T2B illustrated in FIG. 7 are arranged inside each mesh ofthe second mesh pattern MP2 formed of the second detection electrodeportions 21A, but the first dummy unit pattern T1B and the second dummyunit pattern T2B are not limited to those illustrated in FIGS. 4 and 7.

FIG. 10 illustrates a partial plan view of only a first electrode 31 inan electrode intersection portion of a conductive member according toEmbodiment 2 seen from a viewing side. The first electrode 31 is formedon the first surface 5A of the transparent insulating substrate 5illustrated in FIG. 1.

The first electrode 31 has first detection electrode portions 31A whichare drawn by relatively thick lines in FIG. 10 and dummy patternportions 31B in the first electrode which are drawn by relatively thinlines in FIG. 10. The first detection electrode portions 31A and thedummy pattern portions 31B in the first electrode are respectivelyformed of the metal fine wires M1A and the metal fine wires M1B, and thedummy pattern portions 31B in the first electrode are arranged so as tobe not electrically connected to the first detection electrode portions31A and insulated from the first detection electrode portions 31A.

In the same manner as the first detection electrode portions 11A inEmbodiment 1, the first detection electrode portions 31A form the firstmesh pattern MP1 having the first mesh pitch PA1 to which the pluralityof first mesh cells C1 are electrically connected, by using the rhombicfirst mesh cells C1 as constitutional units.

The dummy pattern portions 31B in the first electrode having at leastone third dummy unit pattern T3B as illustrated in FIG. 11 are arrangedinside the first mesh cells C1 of the first mesh pattern MP1. The metalfine wires M1B constituting the dummy pattern portions 31B in the firstelectrode and the metal fine wires M1A constituting the first mesh cellsC1 are spaced by the first gap G1A and the second gap G1B which islonger than the first gap G1A

FIG. 12 illustrates a partial plan view of only a second electrode 41 inthe electrode intersection portion of the conductive member according toEmbodiment 2 seen from a viewing side. The second electrode 41 is formedon the second surface 5B of the transparent insulating substrate 5illustrated in FIG. 1.

The second electrode 41 has second detection electrode portions 41Adrawn by relatively thick broken lines in FIG. 12 and dummy patternportions 41B in the second electrode drawn by relatively thin brokenlines in FIG. 12. The second detection electrode portions 41A and thedummy pattern portions 41B in the second electrode are respectivelyformed of the metal fine wires M2A and the metal fine wires M2B, and thedummy pattern portions 41B in the second electrode are arranged so as tobe not electrically connected to the second detection electrode portions41A and insulated from the second detection electrode portions 41A.

In the same manner as the first mesh pattern MP1, the second detectionelectrode portions 41A form the second mesh pattern MP2 having thesecond mesh pitch PA2 by using the rhombic second mesh cells C2 as theconstitutional units.

Also, the dummy pattern portions 41B in the second electrode which has afourth dummy unit pattern T4B as illustrated in FIG. 13 are arrangedinside the second mesh cell C2 of the second mesh pattern MP2. The metalfine wires M2B constituting the dummy pattern portions 41B in the secondelectrode and the metal fine wires M2A constituting the second meshcells C2 are spaced by the first gap G2A and the second gap G2B which islonger than the first gap G2A.

The third dummy unit pattern T3B and the fourth dummy unit pattern T4Bused in Embodiment 2 have pattern shapes different from the first dummyunit pattern T1B and the second dummy unit pattern T2B in Embodiment 1as illustrated in FIGS. 4 and 7. The third dummy unit pattern T3B is apattern in which the metal fine wires M1B that form the dummy patternportions 31B in the first electrode intersect with each other in a crossshape, and the fourth dummy unit pattern T4B has points at which themetal fine wires M2B that form the dummy pattern portions 41B in thesecond electrode intersect with each other in a cross shape.

Also in Embodiment 2, in the same manner as Embodiment 1, the secondmesh pattern MP2 is arranged so as to be deviated by ¼ of the first meshpitch PA1 such that a center of gravity of the first mesh cell C1 and apeak of the second mesh cell C2 are overlapped with each other, withrespect to the first mesh pattern MP1. Accordingly, in the region R0 inthe electrode intersection portion, in a case where the first electrodes31 and the second electrodes 41 are observed on the viewing side, asillustrated in FIG. 14, the first detection electrode portions 31A ofthe first electrodes 31 and the dummy pattern portions 31B in the firstelectrode, and the second detection electrode portions 41A of the secondelectrodes 41 and the dummy pattern portions 41B in the second electrodeare combined with each other, so as to form the third mesh pattern MP3constituted by rhombic third mesh cells C3, in the same manner as inEmbodiment 1. The second mesh pitch PA2 has a value of ¼ of the firstmesh pitch PA1 and the second mesh pitch PA2 of the first mesh patternMP1 and the second mesh pattern MP2.

In the same manner, even in a case where the dummy pattern portions 31Bin the first electrode that have the third dummy unit pattern T3Billustrated in FIG. 11 are arranged inside the first mesh cells C1 ofthe first mesh pattern MP1, and the dummy pattern portions 41B in thesecond electrode that have the fourth dummy unit pattern T4B illustratedin FIG. 13 are arranged inside the second mesh cell C2 of the secondmesh pattern MP2, the third mesh pattern MP3 having the third mesh pitchPA3 can be formed.

Therefore, the first mesh pitch PA1 of the first mesh pattern MP1 thatis formed by the first detection electrode portions 31A of the firstelectrodes 31 that is used for the detection of a touch operation andthe second mesh pitch PA2 of the second mesh pattern MP2 that is formedby the second detection electrode portions 41A of the second electrodes41 can be set to be four times of the size of the third mesh pitch PA2of the third mesh pattern MP3.

Accordingly, in the same manner as in Embodiment 1, the presence of themetal fine wires M1A, M1B, M2A, and M2B become invisible in a case ofbeing observed on the viewing side, the sizes and the angles of thethird mesh cell C3 can be selected such that the generation of the moireis decreased in a case where the display device is used by beingcombined with the touch panel 2, so as to design the third mesh patternMP3, and thus the parasitic capacitances of the first detectionelectrode portions 31A and the second detection electrode portions 41Acan be reduced. Therefore, even in a case where a detection electrodeportion with a large mesh pattern having a wide pitch which has lessparasitic capacitance and high detection sensitivity is used, thevisibility can be improved, and also in a case where the touch panel 2and the display device are combined with each other to be used, thegeneration of the moire can be suppressed.

Embodiment 3

FIG. 15 illustrates a partial plan view of only a first electrode 51 inan electrode intersection portion of a conductive member according toEmbodiment 3 seen from a viewing side. The first electrode 51 is formedon the first surface 5A of the transparent insulating substrate 5illustrated in FIG. 1.

The first electrode 51 has first detection electrode portions 51A whichare drawn by relatively thick lines in FIG. 15 and dummy patternportions 51B in the first electrode which are drawn by relatively thinlines in FIG. 15. The first detection electrode portions 51A and thedummy pattern portions 51B in the first electrode are respectivelyformed of the metal fine wires M1A and the metal fine wires M1B, and thedummy pattern portions 51B in the first electrode are arranged so as tobe not electrically connected to the first detection electrode portions51A and insulated from the first detection electrode portions 51A.

In the same manner as the first detection electrode portions 11A inEmbodiment 1, the first detection electrode portions 51A form the firstmesh pattern MP1 having the first mesh pitch PA1 by using the rhombicfirst mesh cells C1 as constitutional units and electrically connectingthe plurality of first mesh cells C1.

Also, the dummy pattern portions 51B in the first electrode which has afifth dummy unit pattern T5B as illustrated in FIG. 16 are arrangedinside the first mesh cell C1 of the first mesh pattern MP1. The metalfine wires M1B constituting the dummy pattern portions 51B in the firstelectrode and the metal fine wires M1A constituting the first mesh cellsC1 are spaced by the first gap G1A.

FIG. 17 illustrates a partial plan view of only a second electrode 61 inthe electrode intersection portion of the conductive member according toEmbodiment 3 seen from a viewing side. The second electrode 61 is formedon the second surface 5B of the transparent insulating substrate 5illustrated in FIG. 1.

The second electrode 61 has second detection electrode portions 61Adrawn by relatively thick broken lines in FIG. 17 and dummy patternportions 61B in the second electrode drawn by relatively thin brokenlines in FIG. 17. The second detection electrode portions 61A and thedummy pattern portions 61B in the second electrode are respectivelyformed of metal fine wires M2A and metal fine wires M2B, and the dummypattern portions 61B in the second electrode are arranged so as be notelectrically connected to the second detection electrode portions 61Aand be insulated from the second detection electrode portions 61A.

In the same manner as the first mesh pattern MP1, the second detectionelectrode portions 61A form the second mesh pattern MP2 having thesecond mesh pitch PA2 by using the rhombic second mesh cells C2 asconstitutional units and electrically connecting the plurality of secondmesh cells C2.

Also, the dummy pattern portions 61B in the second electrode which has asixth dummy unit pattern T6B as illustrated in FIG. 18 are arrangedinside each mesh of the second mesh pattern MP2. The metal fine wiresM2B constituting the dummy pattern portions 61B in the second electrodeand the metal fine wires M2A constituting the second mesh cells C2 arespaced by the first gap G2A.

The fifth dummy unit pattern T5B and the sixth dummy unit pattern T6Bused in Embodiment 3 have pattern shapes different from the first dummyunit pattern T1B and the second dummy unit pattern T2B in Embodiment 1as illustrated in FIGS. 4 and 7. The fifth dummy unit pattern T5B andthe sixth dummy unit pattern T6B have the shape identical to each other,and the metal fine wires M1B that form the dummy pattern portions 51B inthe first electrode and the metal fine wires M2B that form the dummypattern portions 61B in the second electrode respectively have points atwhich the metal fine wires intersect with each other in a cross shape.

Also in Embodiment 3, in the same manner as Embodiment 1, the secondmesh pattern MP2 is arranged so as to be deviated by ¼ of the first meshpitch PA1 with respect to the first mesh pattern MP1. Accordingly, inthe region R0 in the electrode intersection portion, in a case where thefirst electrodes 51 and the second electrodes 61 are observed on theviewing side, as illustrated in FIG. 19, the first detection electrodeportions 51A of the first electrodes 51 and the dummy pattern portions51B in the first electrode, and the second detection electrode portions61A of the second electrodes 61 and the dummy pattern portions 61B inthe second electrode are combined with each other, so as to form thethird mesh pattern MP3 using the rhombic third mesh cell C3 asconstitutional units and having the third mesh pitch PA3, in the samemanner as in Embodiment 1. The third mesh pitch PA3 has a value of ¼ ofthe first mesh pitch PA1 and the second mesh pitch PA2 of the first meshpattern MP1 and the second mesh pattern MP2.

In the same manner, even in a case where the dummy pattern portions 51Bin the first electrode that have the fifth dummy unit pattern T5Billustrated in FIG. 16 are arranged inside the first mesh cells C1 ofthe first mesh pattern MP1, and the dummy pattern portions 61B in thesecond electrode that have the sixth dummy unit pattern T6B illustratedin FIG. 18 are arranged inside the second mesh cell C2 of the secondmesh pattern MP2, the third mesh pattern MP3 having the third mesh pitchPA3 can be formed.

Therefore, the first mesh pitch PA1 of the first mesh pattern MP1 thatis formed by the first detection electrode portions 51A of the firstelectrodes 51 that is used for the detection of a touch operation andthe second mesh pitch PA2 of the second mesh pattern MP2 that is formedby the second detection electrode portions 61A of the second electrodes61 can be set to be four times of the size of the third mesh pitch PA3of the third mesh pattern MP3.

Accordingly, in the same manner as in Embodiment 1, the presence of themetal fine wires M1A, M1B, M2A, and M2B become invisible in a case ofbeing observed on the viewing side, the sizes and the angles of thethird mesh cell C3 can be selected such that the generation of the moireis decreased in a case where the display device is used by beingcombined with the touch panel 2, so as to design the third mesh patternMP3, and thus the parasitic capacitances of the first detectionelectrode portions 51A and the second detection electrode portions 61Acan be reduced. Therefore, even in a case where a detection electrodeportion with a large mesh pattern having a wide pitch which has lessparasitic capacitance and high detection sensitivity is used, thevisibility is improved, and also in a case where the touch panel 2 andthe display device are combined with each other to be used, thegeneration of the moire can be suppressed.

Embodiment 4

FIG. 20 illustrates a partial plan view of a first electrode 71 and afirst dummy electrode 72 in an electrode intersection portion of aconductive member according to Embodiment 4 seen from a viewing side.The first electrode 71 and the first dummy electrodes 72 are formed onthe first surface 5A of the transparent insulating substrate 5illustrated in FIG. 1.

The first electrode 71 is arranged in a region R1A formed along thefirst direction D1, and the first dummy electrode 72 is arranged in aregion RIB adjacent to the region R1A. That is, the first dummyelectrode 72 is arranged between the first electrodes 71 adjacent toeach other. The first electrode 71 and the first dummy electrode 72 arearranged so as to be insulated from each other.

The first electrode 71 has first detection electrode portions 71A whichare drawn by relatively thick lines in FIG. 20 and dummy patternportions 71B in the first electrode which are drawn by relatively thinlines in FIG. 20. The first detection electrode portions 71A and thedummy pattern portions 71B in the first electrode are respectivelyformed of the metal fine wires M1A and the metal fine wires M1B, and thedummy pattern portions 71B in the first electrode are arranged so as tobe not electrically connected to the first detection electrode portions71A and insulated from the first detection electrode portions 71A.

The first dummy electrode 72 has the same pattern as that of the firstelectrode 71, but is a floating electrode, and does not function as asensor in the touch panel 2.

In the same manner as the first detection electrode portions 11A inEmbodiment 1, the first detection electrode portions 71A form the firstmesh pattern MP1 having the first mesh pitch PA1 by using the rhombicfirst mesh cells C1 as constitutional units and electrically connectingthe plurality of first mesh cells C1.

Also, the dummy pattern portions 71B in the first electrode which has aseventh dummy unit pattern T7B are arranged inside the first mesh cellC1 of the first mesh pattern MP1. The metal fine wires M1B constitutingthe dummy pattern portions 71B in the first electrode and the metal finewires M1A constituting the first mesh cells C1 are spaced by the firstgap G1A. The first electrode 71 has a portion in which the metal finewire M1A and the metal fine wire M1B are spaced from each other by asecond gap G1B that is longer than the first gap G1A.

FIG. 21 illustrates a partial plan view of a second electrode 81 and asecond dummy electrode 82 in an electrode intersection portion of aconductive member according to Embodiment 4 seen from a viewing side.The second electrode 81 and the second dummy electrodes 82 are formed onthe second surface 5B of the transparent insulating substrate 5illustrated in FIG. 1. The second electrode 81 is arranged in a regionR2A formed along the second direction D2, and the second dummy electrode82 is arranged in a region R2B adjacent to the region R2A. That is, thesecond dummy electrode 82 is arranged between the second electrodes 81adjacent to each other. The second electrode 81 and the second dummyelectrode 82 are arranged so as to be insulated from each other.

The second electrode 81 has second detection electrode portions 81Adrawn by relatively thick broken lines in FIG. 21 and dummy patternportions 81B in the second electrode drawn by relatively thin brokenlines in FIG. 21. The second detection electrode portions 81A and thedummy pattern portions 81B in the second electrode are respectivelyformed of metal fine wires M2A and metal fine wires M2B, and the dummypattern portions 81B in the second electrode are arranged so as be notelectrically connected to the second detection electrode portions 81Aand to be insulated from the second detection electrode portions 81A.

The second dummy electrode 82 has the same configuration as that of thefirst electrode 81, but is a floating electrode, and does not functionas a sensor in the touch panel 2.

In the same manner as the first mesh pattern MP1, the second detectionelectrode portions 81A form the second mesh pattern MP2 having thesecond mesh pitch PA2 by using the rhombic second mesh cells C2 asconstitutional units and electrically connecting the plurality of secondmesh cells C2.

Also, the dummy pattern portions 81B in the second electrode which hasan eighth dummy unit pattern T8B are arranged inside each mesh of thesecond mesh pattern MP2. The metal fine wires M2B constituting the dummypattern portions 81B in the second electrode and the metal fine wiresM2A constituting the second mesh cells C2 are spaced by the first gapG2A. The second electrode 81 has a portion in which the metal fine wireM2A and the metal fine wire M2B are spaced from each other by a secondgap G2B that is longer than the first gap G2A.

The seventh dummy unit pattern T7B used in Embodiment 4 has a patternshape different from the first dummy unit pattern T1B in Embodiment 1 asillustrated in FIG. 4. As illustrated in FIG. 20, the seventh dummy unitpattern T7B is a pattern in which the metal fine wires M1B that do notinclude a metal fine wire do not intersect with each other in a crossshape and do not completely cross with each other, and has disconnectedportions B1 in which the metal fine wires M1B are disconnected. Thelength of the disconnected portion B1 is 0.5 μm to 30 μm and preferably5 μm to 20 μm.

In the first mesh cell C1, projection portions J1 projecting from onesides of the first mesh cells C1 are formed so as to abut end portionsof the metal fine wires M1B that form the dummy pattern portions 71B inthe first electrode. The end portions of the metal fine wires M1B andthe end portions of the projection portion J1 are spaced from each otherby the first gap G1A. The first electrode 71 has a portion in which themetal fine wire M1A and the metal fine wire M1B are spaced from eachother by the second gap G1B that is longer than the first gap G1A. Inview of reducing the parasitic capacitance of the electrode, the lengthof the projection portion J1 is preferably 50 μm or less andparticularly preferably 10 μm to 30 μm. Otherwise, the length of theprojection portion J1 is preferably 1/10 or less of a length of one sideof the first mesh cell C1 and more preferably 1/100 to 1/20.

In the same manner as in the seventh dummy unit pattern T7B, the eighthdummy unit pattern T8B used in Embodiment 4 is a pattern in which themetal fine wires M2B that do not include a metal fine wire do notintersect with each other in a cross shape and do not completely crosswith each other, and has the disconnected portions B2 in which the metalfine wires M2B are disconnected. The length of the disconnected portionB2 is 0.5 μm to 30 μm and preferably 5 μm to 20 μm.

In the second mesh cell C2, projection portions J2 projecting from onesides of the second mesh cells C2 are formed so as to abut end portionsof the metal fine wires M2B that form the dummy pattern portions 81B inthe second electrode. The end portions of the metal fine wires M2B andthe end portions of the projection portion J2 are spaced from each otherby the first gap G2A. In view of reducing the parasitic capacitance ofthe electrode, the length of the projection portion J2 is preferably 50μm or less and particularly preferably 10 μm to 30 μm. Otherwise, thelength of the projection portion J2 is preferably 1/10 or less of alength of one side of the second mesh cell C2 and more preferably 1/100to 1/20.

Also in Embodiment 4, in the same manner as Embodiment 1, the secondmesh pattern MP2 is arranged so as to be deviated by ¼ of the first meshpitch PA1 with respect to the first mesh pattern MP1. Accordingly, inthe electrode intersection portion, in a case where the first electrodes71 and the second electrodes 81 are observed on the viewing side, asillustrated in FIG. 22, the first detection electrode portions 71A ofthe first electrodes 71 and the dummy pattern portions 71B in the firstelectrode, and the second detection electrode portions 81A of the secondelectrodes 81 and the dummy pattern portions 81B in the second electrodeare combined with each other, so as to form the third mesh pattern MP3using the rhombic third mesh cell C3 as constitutional units and havingthe third mesh pitch PA3, in the same manner as in Embodiment 1. Thethird mesh pitch PA3 has a value of ¼ of the first mesh pitch PA1 andthe second mesh pitch PA2 of the first mesh pattern MP1 and the secondmesh pattern MP2.

In the same manner, even in a case where the dummy pattern portions 71Bin the first electrode that have the seventh dummy unit pattern T7Billustrated in FIG. 20 are arranged inside the first mesh cells C1 ofthe first mesh pattern MP1, and the dummy pattern portions 81B in thesecond electrode that have the eighth dummy unit pattern T8B illustratedin FIG. 21 are arranged inside the second mesh cell C2 of the secondmesh pattern MP2, the third mesh pattern MP3 having the third mesh pitchPA3 can be formed.

Therefore, the first mesh pitch PA1 of the first mesh pattern MP1 thatis formed by the first detection electrode portions 71A of the firstelectrodes 71 that is used for the detection of a touch operation andthe second mesh pitch PA2 of the second mesh pattern MP2 that is formedby the second detection electrode portions 81A of the second electrodes81 can be set to be four times of the size of the third mesh pitch PA3of the third mesh pattern MP3.

Accordingly, in the same manner as in Embodiment 1, the presence of themetal fine wires M1A, M1B, M2A, and M2B become invisible in a case ofbeing observed on the viewing side, the sizes and the angles of thethird mesh cell C3 can be selected such that the generation of the moireis decreased in a case where the display device is used by beingcombined with the touch panel 2, so as to design the third mesh patternMP3, and thus the parasitic capacitances of the first detectionelectrode portions 71A and the second detection electrode portions 81Acan be reduced. Therefore, even in a case where a detection electrodeportion with a large mesh pattern having a wide pitch which has lessparasitic capacitance and high detection sensitivity is used, thevisibility is improved, and also in a case where the touch panel 2 andthe display device are combined with each other to be used, thegeneration of the moire can be suppressed.

The present invention basically has the configuration as above. In theabove, the conductive member and the touch panel according to theembodiment of the present invention have been described, but the presentinvention is not limited to the above embodiments, and it is obviousthat various improvements and modifications may be performed withoutdeparting from the gist of the present invention.

EXAMPLES

Hereinafter, the present invention is specifically described withreference to the examples. The materials, amounts used, proportions,treatment details, treatment procedures, or the like described in thefollowing examples can be appropriately changed without departing fromthe gist of the present invention, and the scope of the presentinvention is not construed by the following examples restrictively.

<Manufacturing of Touch Panel>

Various photo masks with different exposure patterns were prepared, anda first electrode and a second electrode formed of fine metal wires wererespectively formed on both sides of the transparent insulatingsubstrate, so as to manufacture a conductive member. The metal thinwires were formed by silver wires, by using a polyethylene terephthalatefilm having a thickness of 38 μm as a transparent insulating substrate.

The manufactured conductive member was bonded to a tempered glass havinga thickness of 1.1 mm as a cover panel as a cover panel, by using anoptical transparent pressures sensitive adhesive sheet having athickness of 75 μm of 8146-4 (model number) manufactured by The 3MCompany, so as to manufacture a touch panel having the structureillustrated in FIG. 1.

<Touch Sensitivity Evaluation>

A front end section of a touch pen in which an outer diameter of thefront end section was 1.0 mm was brought in contact with themanufactured touch panel so as to perform the sensitivity evaluation ofthe touch panel. At this point, based on the position detection accuracywith respect to the contact position between the surface of the touchpanel and the front end section of the touch pen, evaluation standardsof A to C were determined as follows. In a case where the evaluation wasA or B, it is determined that detection accuracy was not problematic inpractical use.

A: The position detection accuracy was less than 1.0 mm, and correctposition detection was able to be made.

B: The position detection accuracy was 1.0 mm or more and less than 2.0mm, there was no problem in practical use.

C: The position detection accuracy was 2.0 mm or more, correct positiondetection was not able to be made.

<Visibility Evaluation>

The manufactured touch panel was observed with bare eyes of 10 observersat a position spaced by 5 cm from the front surface of the touch panelso as to evaluate whether metal fine wires were recognized. With respectto the visibility, the evaluation standards of A to C were determined asfollows, the most frequent evaluation result among the evaluationresults of 10 observers was set as a final evaluation result withrespect to the touch panel. In a case where the evaluation was A or B,it is determined that visibility was not problematic in practical use.

A: The metal fine wire was not recognized at all.

B: The metal fine wire was slightly recognized, but was not problematicin practical use.

C: The metal fine wire was clearly recognized.

<Moire Evaluation>

The image displayed in a state in which the manufactured touch panel wasarranged on the liquid crystal display module and the liquid crystaldisplay module performed image display on the entire surface wasobserved with the bare eyes of 10 observers, so as to evaluate whetherthe moire generated on the displayed image was recognized. With respectto the generation of the moire, the evaluation standards of A to C weredetermined as follows, the most frequent evaluation result among theevaluation results of 10 observers was set as a final evaluation resultwith respect to the touch panel. In a case where the evaluation was A orB, it is determined that the moire was not problematic in practical use.

A: The moire was not recognized.

B: The moire was slightly recognized, but was not problematic inpractical use.

C: The moire was noticeable.

Here, the method of manufacturing the conductive member is specificallydescribed.

(Preparation of Silver Halide Emulsion)

The following solutions 2 and 3 were added by an amount corresponding to90% each to the following solution 1 kept at a temperature of 38° C. andpH (potential of hydrogen) of 4.5 with stirring over 20 minutes, so asto form nuclear particles of 0.16 μm. Subsequently, the followingsolutions 4 and 5 were added over 8 minutes, and the following solutions2 and 3 were added each by an amount of the remaining 10% over twominutes, so as to grow particles to 0.21 μm. Further, 0.15 g ofpotassium iodide was added and aged for five minutes so as to completeparticle formation.

Solution 1:

Water . . . 750 ml

Gelatin . . . 9 g

Sodium chloride . . . 3 g

1,3-Dimethylimidazolidine-2-thione . . . 20 mg

Sodium benzenethiosulfonate . . . 10 mg

Citric acid . . . 0.7 g

Solution 2:

Water . . . 300 ml

Silver nitrate . . . 150 g

Solution 3:

Water . . . 300 ml

Sodium chloride . . . 38 g

Potassium bromide . . . 32 g

Potassium hexachloro iridiumate (III) (0.005% KCl 20% aqueous solution). . . 8 ml

Hexachlororhodate ammonium (0.001% NaCl 20% aqueous solution) . . . 10ml

Solution 4:

Water . . . 100 ml

Silver nitrate . . . 50 g

Solution 5:

Water . . . 100 ml

Sodium chloride . . . 13 g

Potassium bromide . . . 11 g

Yellow blood salt . . . 5 mg

Thereafter, washing with water was performed by a flocculation methodaccording to a general method. Specifically, the temperature wasdecreased to 35° C., 3 liters of distilled water was added, and sulfuricacid was used to lower the pH until the silver halide was precipitated(in the range of pH 3.6±0.2). Next, about 3 liters of the supernatantwas removed (first washing with water). Additional 3 liters of distilledwater was added, and sulfuric acid was added, until the silver halidehad precipitated. Again, 3 liters of the supernatant was removed (secondwashing with water). The same operation as the second washing with waterwas further repeated one more time (third washing with water) tocomplete a water washing-desalting step. The emulsion after washing anddesalting was adjusted to pH 6.4 and pAg 7.5, 3.9 g of gelatin, 10 mg ofsodium benzenethiosulfonate, 3 mg of sodium benzenethiosulfinate, 15 mgof sodium thiosulfate, and 10 mg of chloroauric acid were added,chemical sensitization was performed so as to obtain the optimumsensitivity at 55 C, and 100 mg of 1,3,3a,7-tetraazaindene as astabilizer and 100 mg of PROXEL (trade name, manufactured by ICI Co.,Ltd.) as a preservative were added. The finally obtained emulsion was asilver iodochlorobromide cubic grain emulsion including 0.08 mol % ofsilver iodide, having a proportion of silver chlorobromidea of 70 mol %of silver chloride and 30 mol % of silver bromide, and having an averageparticle diameter of 0.22 μm and a coefficient of variation of 9%.

(Preparation of Composition for Forming Photosensitive Layer)

1.2×10⁻⁴ mol/mol Ag of 1,3,3a,7-tetraazaindene, 1.2×10⁻² mol/mol Ag ofhydroquinone, 3.0×10⁻⁴ mol/mol Ag of citric acid, 0.90 g/mol Ag of2,4-dichloro-6-hydroxy-1,3,5-triazine sodium salt, and a slight amountof a hardener were added to the above emulsion, and pH of the coatingsolution was adjusted to 5.6 by using citric acid.

A polymer latex containing a polymer represented by (P-1) anddialkylphenyl PEO sulfate ester as a dispersing agent with respect togelatin contained in the above coating solution (a mass ratio ofdispersing agent/polymer was 2.0/100=0.02) was added such that polymergelatin (mass ratio)=0.5/1 was satisfied.

EPOXY RESIN DY 022 (trade name, manufactured by Nagase ChemteX Corp.)was added as a crosslinking agent. The addition amount of thecrosslinking agent was adjusted such that the amount of the crosslinkingagent in the photosensitive layer described below was 0.09 g/m².

The composition for forming a photosensitive layer was prepared asabove.

The polymer represented by (P-1) described above was synthesized withreference to JP3305459B and JP3754745B.

(Photosensitive Layer Formation Step)

Both sides of the transparent insulating substrate were coated with theabove polymer latex, so as to provide an undercoat layer having athickness of 0.05 μm. As the transparent insulating substrate,polyethylene terephthalate film of 38 μm (manufactured by FujifilmCorporation) was used.

Next, an antihalation layer was formed of a mixture of the above polymerlatex, gelatin, and a dye having an optical density of about 1.0 andbeing decolorized by alkali of a developer was provided on the undercoatlayer. The mixing mass ratio (polymer/gelatin) of the polymer and thegelatin in the antihalation layer was 2/1, and the content of thepolymer was 0.65 g/m².

The antihalation layer was coated with the composition for forming aphotosensitive layer and was further coated with a composition obtainedby mixing the polymer latex, gelatin, EPOCROSS K-2020E (trade name,manufactured by Nippon Shokubai Co., Ltd., oxazoline-based crosslinkingreactive polymer latex) (crosslinkable group: oxazoline group)), andSNOWTEX C (registered trademark, trade name, manufactured by NissanChemical Industries. Ltd., colloidal silica) by a solid content massratio (polymer/gelatin/EPOCROSS K-2020E/SNOWTEX C (registeredtrademark)) of 1/1/0.3/2 such that the amount of gelatin was 0.08 g/m²,so as to obtain a support of which photosensitive layers were formed onboth sides. A support having photosensitive layers formed on both sidesis referred to as a film A. The formed photosensitive layer had a silvercontent of 6.2 g/m² and a gelatin content of 1.0 g/m².

(Exposure and Development Step)

For example, a first photo mask for forming a first electrode having apattern as illustrated in FIG. 3 and a second photo mask for forming asecond electrode having a pattern as illustrated in FIG. 6 wererespectively formed, the first photo mask and the second photo mask werearranged on both sides of the film A, and the both sides weresimultaneously exposed with parallel light by using a high pressuremercury lamp as a light source.

After the exposure, development was performed by using the followingdeveloper, and development was performed by using a fixing solution(trade name, N3X-R for CN16X, manufactured by Fujifilm Corporation).Rinsing with pure water was performed, and the water was dried, so as toobtain a support in which metal fine wires made of Ag (silver) andgelatin layers were formed on both surfaces. The gelatin layer wasformed between the metal wires. The obtained film was referred to as afilm B.

(Composition of Developer)

The following compounds were contained in 1 liter (L) of the developer.

Hydroquinone . . . 0.037 mol/L

N-methylaminophenol . . . 0.016 mol/L

Sodium metaborate . . . 0.140 mol/L

Sodium hydroxide . . . 0.360 mol/L

Sodium bromide . . . 0.031 mol/L

Potassium metabisulfite . . . 0.187 mol/L

(Gelatin Degradation Treatment)

The film B was immersed in an aqueous solution (concentration ofproteolytic enzyme: 0.5 mass %, solution temperature: 40° C.) of aproteolytic enzyme (BIOPLASE AL-15FG manufactured by Nagase ChemteXCorp.) in an aqueous solution for 120 seconds. The film B was extractedfrom the aqueous solution, immersed in warm water (solution temperature:50° C.) for 120 seconds, and washed. The film after gelatin degradationtreatment is referred to as a film C.

<Resistance Reduction Treatment>

A calender treatment was performed on the film C by using a calenderdevice equipped with metal rollers at a pressure of 30 kN. At thispoint, two polyethylene terephthalate films having a rough surface shapeof line roughness Ra=0.2 μm, Sm=1.9 μm (measured with a shape analysislaser microscope VK-X110 manufactured by Keyence Corporation(JIS-B-0601-1994)) were transported such that the rough surfaces facethe front and back surfaces of the film C, and the rough shapes weretransferred and formed on the front and back surfaces of the film C.

After the calender treatment, the film C was passed through anoverheated steam tank at a temperature of 150° C. for 120 seconds toperform heat treatment. The film after the heat treatment is referred toas a film D. This film D was a conductive member.

Next, Examples 1 to 3 and Comparative Examples 1 and 2 are described.

Example 1

Example 1 is a touch panel having a conductive member of the same shapeas that of the conductive member 1 of Embodiment 1 illustrated in FIGS.1 to 9. In the first mesh pattern MP1 and the second mesh pattern MP2,the acute angle of the rhombuses of the first mesh cell C1 and thesecond mesh cell C2 was set to 72 degrees, and the length of one side ofthe first mesh cell C1 and the second mesh cell C2 was set to 696 μm(from an acute angle of 72°, mesh pitches PA1 and PA2 corresponded to818 μm). The line width of all the metal fine wires was 4 μm. The secondgap G1B between the metal fine wires M1A and the metal fine wires M1Band the second gap G2B between the metal fine wires M2A and the metalfine wires M2B had a length of ¼ or more of the length of the side ofeach of the mesh cells C1 and C2, that is, 174 μm or more. The length ofthe relatively small first gap G1A between the metal fine wires M1A andthe metal fine wires M1B and the length of the relatively small firstgap G2A between the metal fine wires M2A and the metal fine wires M2Bwere set to 10 μm. The arrangement pitch of the plurality of firstelectrodes 11 was set to 4.5 mm, and the width of each of the firstelectrodes 11 was set to 4.1 mm. The arrangement pitch of the pluralityof second electrodes 21 was set to 4.5 mm, and the width of each of thesecond electrodes 21 was set to 2.25 mm. Dummy electrodes were arrangedbetween the adjacent first electrodes 11 and between the adjacent secondelectrodes 21.

Example 2

Example 2 was the same as Example 1 except that the conductive memberhad the same shape as the conductive member of Embodiment 2 illustratedin FIGS. 10 to 14. In the same manner as in Example 1, the second gapG1B between the metal fine wires M1A and the metal fine wires M1B andthe second gap G2B between the metal fine wires M2A and the metal finewires M2B had a length of ¼ or more of the length of the side of themesh cells C1 and C2, that is, 174 μm or more. The length of therelatively small first gap G1A between the metal fine wires M1A and themetal fine wires M1B and the length of the relatively small first gapG2A between the metal fine wires M2A and the metal fine wires M2B wereset to 10 μm.

Example 3

Example 3 was the same as Example 1 except that the conductive memberhad the same shape as the conductive member of Embodiment 3 illustratedin FIGS. 15 to 19. That is, the conductive member of Example 3 did nothave the second gaps GI B and G2B which were relative large gaps.Meanwhile, the length of the first gaps G1A and G2A was set to 10 μm.

Example 4

Example 4 was the same as Example 1 except that the conductive memberhad the same shape as the conductive member of Embodiment 4 illustratedin FIGS. 20 to 22. In the same manner as in Example 1, the second gapG1B between the metal fine wires M1A and the metal fine wires M1B andthe second gap G2B between the metal fine wires M2A and the metal finewires M2B had a length of ¼ or more of the length of the side of themesh cells C1 and C2, that is, 174 μm or more. The length of therelatively small first gap G1A between the metal fine wires M1A and themetal fine wires M1B and the length of the relatively small first gapG2A between the metal fine wires M2A and the metal fine wires M2B wereset to 10 μm.

The length of the projection portions J1 and J2 was set to 20 μm.

Comparative Example 1

Comparative Example 1 was the same as Example 1 except for not havingthe dummy pattern portions 11B in the first electrode of the firstelectrodes 11 in the conductive member 1 of Embodiment 1 illustrated inFIGS. 1 to 9 and the dummy pattern portions 21B in the second electrodeof the second electrodes 21.

FIG. 23 illustrates a partial plan view of only a first electrode 91 inan electrode intersection portion of a conductive member according toComparative Example 1 seen from a viewing side. The first electrode 91is formed on the first surface 5A of the transparent insulatingsubstrate 5 illustrated in FIG. 1.

The first electrode 91 does not have a dummy pattern portion in theelectrode but only has first detection electrode portions 91Aillustrated in FIG. 23. The first detection electrode portion 91A isformed from the metal fine wires M1A.

In the same manner as the first detection electrode portions 11A inEmbodiment 1, the first detection electrode portions 91A form the firstmesh pattern MP1 having the first mesh pitch PA1 to which the pluralityof first mesh cells C1 are electrically connected, by using the rhombicfirst mesh cells C1 as constitutional units.

FIG. 24 illustrates a partial plan view of only a second electrode 92 inan electrode intersection portion of a conductive member according toComparative Example 1 seen from a viewing side. The second electrode 92is formed on the second surface 5B of the transparent insulatingsubstrate 5 illustrated in FIG. 1.

In the same manner as the first electrode 91, the second electrode 92does not have a dummy pattern portion in the electrode but only hassecond detection electrode portions 92A illustrated in FIG. 24. Thesecond detection electrode portion 92A is formed from the metal finewires M2A.

In the same manner as the first mesh pattern MP1, the second detectionelectrode portions 92A form the second mesh pattern MP2 having thesecond mesh pitch PA2 to which the plurality of second mesh cells C2 areelectrically connected, by using the rhombic second mesh cells C2 asconstitutional units.

In Comparative Example 1, the second mesh pattern MP2 is arranged so asto be deviated by ½ of the first mesh pitch PA1 with respect to thefirst mesh pattern MP1. Accordingly, in the region R0 in the electrodeintersection portion, in a case where the first electrodes 91 and thesecond electrodes 92 are observed on the viewing side, as illustrated inFIG. 25, the first detection electrode portions 91A of the firstelectrodes 91 and the second detection electrode portions 92A of thesecond electrode 92 are combined with each other, so as to form thefourth mesh pattern MP4 using the rhombic fourth mesh cell C4 asconstitutional units and having the fourth mesh pitch PA4. The fourthmesh pitch PA4 has a value of ½ of the first mesh pitch PA1 and thesecond mesh pitch PA2 of the first mesh pattern MP1 and the second meshpattern MP2.

Comparative Example 2

FIG. 26 illustrates a partial plan view of only a first electrode 101 inan electrode intersection portion of a conductive member according toComparative Example 2 seen from a viewing side. The first electrode 101is formed on the first surface 5A of the transparent insulatingsubstrate 5 illustrated in FIG. 1.

In the same manner as Comparative Examples 1, the first electrode 101does not have a dummy pattern portion in the electrode but only hasfirst detection electrode portions 101A illustrated in FIG. 26. Thefirst detection electrode portion 101A is formed from the metal finewires M1A.

The first detection electrode portions 101A form the fifth mesh patternMP5 having the fourth mesh pitch PA4 to which the plurality of fourthmesh cells C4 are electrically connected, by using the rhombic fourthmesh cells C4 as constitutional units. The fourth mesh pitch PA4 has avalue of ½ of the first mesh pitch PA1 and the second mesh pitch PA2 ofthe first mesh pattern MP1 and the second mesh pattern MP2 inComparative Example 1.

FIG. 27 illustrates a partial plan view of only a second electrode 102in an electrode intersection portion of a conductive member according toComparative Example 2 seen from a viewing side. The second electrode 102is formed on the second surface 5B of the transparent insulatingsubstrate 5 illustrated in FIG. 1.

In the same manner as the first electrode 101, the second electrode 102does not have a dummy pattern portion in the electrode but only hassecond detection electrode portions 102A illustrated in FIG. 27. Thesecond detection electrode portion 102A is formed from the metal finewires M2A.

In the same manner as the fifth mesh pattern MP5, the second detectionelectrode portions 102A form the sixth mesh pattern MP6 having thefourth mesh pitch PA4 to which the plurality of fourth mesh cells C4 areelectrically connected, by using the rhombic fourth mesh cells C4 asconstitutional units.

In Comparative Example 2, the sixth mesh pattern MP6 is arranged so asto be deviated by ½ of the fourth mesh pitch PA4 with respect to thefifth mesh pattern MP5. Accordingly, in the region R0 in the electrodeintersection portion, in a case where the first electrodes 101 and thesecond electrodes 102 are observed on the viewing side, as illustratedin FIG. 28, the first detection electrode portions 101A of the firstelectrodes 101 and the second detection electrode portions 102A of thesecond electrode 102 are combined with each other, so as to form thethird mesh pattern MP3 using the rhombic third mesh cell C3 asconstitutional units and having the third mesh pitch PA3. The third meshpitch PA3 has a value of ½ of the fourth mesh pitch PA4 of the fifthmesh pattern MP5 and the sixth mesh pattern MP6.

In this manner, Comparative Example 2 is the same as Comparative Example1 except that the length of one side of the rhombic fourth mesh cell C4using the fifth mesh pattern MP5 formed of the first detection electrodeportions 101A and the sixth mesh pattern MP6 formed of the seconddetection electrode portions 102A, as constitutional units is caused tobe ½ of 348 μm (from an acute angle of 72 degrees, the mesh pitch PA4corresponds to 409 μm) compared with the length (696 μm) of one side ofthe first mesh cell C1 and the second mesh cell C2 of the first meshpattern MP1 and the second mesh pattern MP2 in Comparative Example 1.

The evaluation results of Examples 1 to 4 and Comparative Examples 1 and2 are presented in the following table.

TABLE 1 Mesh pitch in first detection Dummy Metal fine wires inelectrode portion and second pattern dummy pattern portion in detectionelectrode portion portion in electrode intersect with [μm] electrodeeach other in cross shape Sensitivity Visibility Moire Example 1 818Presence Absence A A A Example 2 818 Presence Presence A B B Example 3818 Presence Presence B B B Example 4 818 Presence Absence A A AComparative 818 Absence Absence A C C Example 1 Comparative 409 AbsenceAbsence C A A Example 2

As presented in Table 1, in Examples 1 to 4, all of the sensitivityevaluation, the visibility evaluation, and the moire evaluation were “A”or “B”, and the detection sensitivity was improved, the visibility wasexcellent, and the generation of the moire can be decreased.Particularly, in Examples 1 and 4, all of the sensitivity evaluation,the visibility evaluation, and the moire evaluation were “A”, thedetection sensitivity was excellent, the visibility was improved, andthe generation of the moire was decreased.

Meanwhile, in Comparative Example 1, the sensitivity evaluation was “A”,but the visibility evaluation and the moire evaluation were “C”. InComparative Example 2, the visibility evaluation and the moireevaluation were “A”, but the sensitivity evaluation was “C”. In thismanner, in Comparative Examples 1 and 2, all of the sensitivity, thevisibility, and the moire were not highly evaluated.

In Example 3, since, according to the presence of the dummy patternportions 51B in the first electrode, four cells having a half pitch ofthe first mesh pitch PA1 were formed in the first mesh cells C1 of thefirst mesh pattern MP1 of the first detection electrode portions 51A,and in the same manner, according to the presence of the dummy patternportions 61B in the second electrode, four cells having a half pitch ofthe second mesh pitch PA2 were formed in the second mesh cell C2 of thesecond mesh pattern MP2 of the second detection electrode portions 61A,the parasitic capacitances of the first detection electrode portions 51Aand the second detection electrode portions 61A were increased comparedwith those in Examples 1 and 2, and thus the sensitivity evaluation was“B”.

In Examples 2 and 3 having points at which the dummy pattern portions inthe second electrode intersected with each other in a cross shape, thevisibility evaluation and the moire evaluation were “B”, but this isbecause points at which the dummy pattern portions in the secondelectrode intersected with each other in a cross shape were formedlarger than the design value due to diffracted light from the photo maskedge portion in the exposure and development step in a case ofmanufacturing the conductive member.

In Comparative Example 1, it is considered that, since all of the firstelectrode 91 and the second electrode 92 have the first mesh pitch PA1,the sensitivity evaluation was “A”, but the mesh pitch (fourth meshpitch PA4) of the fourth mesh pattern MP4 formed by overlapping thefirst electrodes 91 and the second electrodes 92 with each other wastwice the mesh pitch (the third mesh pitch PA3) of the third meshpattern MP3 in Examples 1 to 3, that is, the mesh pitch was wide, thevisibility evaluation and the moire evaluation were “C”.

It is considered that Comparative Example 2 did not have a dummy patternportion in the electrode, but since the first electrodes 101 and thesecond electrodes 102 were overlapped with each other, the third meshpattern MP3 having the third mesh pitch PA3 was formed as in Example 1,and thus the visibility evaluation and the moire evaluation were “A”.Meanwhile, it is considered that, since the fifth mesh pattern MP5formed of the first detection electrode portion 101A of the firstelectrode 101 used for detecting a touch operation and the sixth meshpattern MP6 formed by the second detection electrode portion 102A of thesecond electrode 102 had a half pitch (fourth mesh pitch PA4) of thefirst mesh pitch PA1 in Example 1, the parasitic capacitance of thefirst detection electrode portion 101A and the second detectionelectrode portion 102A were increased, and thus the sensitivityevaluation was “C”.

Another aspect is noted as follows.

A conductive member comprising:

a plurality of first electrodes each of which extend in a firstdirection and which are arranged in juxtaposition in a second directionorthogonal to the first direction: and

a plurality of second electrodes each of which extend in the seconddirection and which are arranged in juxtaposition in the firstdirection,

wherein the plurality of first electrodes and the second electrodes arearranged to face each other in an insulation state,

the first electrode has a first detection electrode portion having afirst mesh pattern constituted by electrically connecting a plurality offirst mesh cells formed of metal fine wires and a dummy pattern portionin a first electrode which is formed of metal fine wires arranged insidethe first mesh cell of the first mesh pattern so as to be insulated fromthe first detection electrode portion,

the second electrode has a second detection electrode portion having asecond mesh pattern constituted by electrically connecting a pluralityof second mesh cells formed of metal fine wires and a dummy patternportion in the second electrode which is formed of metal fine wiresarranged inside the second mesh cell of the second mesh pattern so as tobe insulated from the second detection electrode portion, and

in a region in which the first electrode and the second electrode areoverlapped with each other, a third mesh pattern is constituted by aplurality of third mesh cells formed by combining the first detectionelectrode portion, the dummy pattern portion in the first electrode, thesecond detection electrode portion, and the dummy pattern portion in thesecond electrode.

EXPLANATION OF REFERENCES

-   -   1: conductive member    -   2: touch panel    -   2A: front surface    -   2B: back surface    -   3: cover panel    -   4: adhesive    -   5: transparent insulating substrate    -   5A: first surface    -   5B: second surface    -   7A, 7B: protective layer    -   11, 31, 51, 71, 81, 91, 101: first electrode    -   11A, 31A, 51A, 71A, 91A, 101A: first detection electrode portion    -   11B, 31B, 51B, 71B: dummy pattern portion in a first electrode    -   12: first edge part wire    -   13: first external connection terminal    -   14: first connector portion    -   21, 41, 61, 81, 92, 102: second electrode    -   21A, 41A, 61A, 72A, 81A, 92A, 102A: second detection electrode        portion    -   21B, 41B, 61B, 81B: dummy pattern portion in a second electrode    -   22: second edge part wire    -   23: second external connection terminal    -   24: second connector portion    -   72: first dummy electrode    -   82: second dummy electrode    -   S1: transmissive region    -   S2: edge part region    -   D1: first direction    -   D2: second direction    -   6A, 6B, M1A, M1B, M2A, M2B: metal fine wire    -   G1A, G2A: first gap    -   G1B, G2B: second gap    -   W1A, W1B, W2A, W2B: line width    -   R0, R1A, R1B, R2A, R2B: region    -   T1A: first detection unit pattern    -   T1B: first dummy unit pattern    -   T2B: second dummy unit pattern    -   T3B: third dummy unit pattern    -   T4B: fourth dummy unit pattern    -   T5B: fifth dummy unit pattern    -   T6B: sixth dummy unit pattern    -   T7B: seventh dummy unit pattern    -   T8B: eighth dummy unit pattern    -   MP1: first mesh pattern    -   MP2: second mesh pattern    -   MP3: third mesh pattern    -   MP4: fourth mesh pattern    -   MP5: fifth mesh pattern    -   MP6: sixth mesh pattern    -   C1: first mesh cell    -   C2: second mesh cell    -   C3: third mesh cell    -   C4: fourth mesh cell    -   PA1: first mesh pitch    -   PA2: second mesh pitch    -   PA3: third mesh pitch    -   PA4: fourth mesh pitch    -   J1, J2: projection portion    -   B1, B2: disconnected portion    -   ΔL: distance

What is claimed is:
 1. A conductive member having a transmissive region,comprising: a transparent insulating member; a plurality of firstelectrodes each of which extend in a first direction and which arearranged in juxtaposition in a second direction orthogonal to the firstdirection; and a plurality of second electrodes each of which extend inthe second direction and which are arranged in juxtaposition in thefirst direction, wherein the plurality of first electrodes and theplurality of second electrodes are opposed to each other with thetransparent insulating member interposed therebetween, the firstelectrode has a first detection electrode portion having a first meshpattern constituted by electrically connecting a plurality of first meshcells formed of metal fine wires and a dummy pattern portion in thefirst electrode which is formed of metal fine wires arranged inside thefirst mesh cell of the first mesh pattern so as to be insulated from thefirst detection electrode portion, the second electrode has a seconddetection electrode portion having a second mesh pattern constituted byelectrically connecting a plurality of second mesh cells formed of metalfine wires and a dummy pattern portion in the second electrode which isformed of metal fine wires arranged inside the second mesh cell of thesecond mesh pattern so as to be insulated from the second detectionelectrode portion, in a region in which the first electrode and thesecond electrode are overlapped with each other, a third mesh pattern isconstituted by a plurality of third mesh cells formed by combining thefirst detection electrode portion, the dummy pattern portion in thefirst electrode, the second detection electrode portion, and the dummypattern portion in the second electrode, and the dummy pattern portionin the first electrode or the dummy pattern portion in the secondelectrode includes metal fine wires intersecting to each other.
 2. Theconductive member according to claim 1, wherein the dummy patternportion in the first electrode and the dummy pattern portion in thesecond electrode include metal fine wires intersecting to each other. 3.The conductive member according to claim 2, wherein the dummy patternportion in the first electrode and the dummy pattern portion in thesecond electrode include metal fine wires intersecting to each other ina cross shape.
 4. The conductive member according to claim 1, furthercomprising: a first dummy electrode arranged between the firstelectrodes adjacent to each other; and a second dummy electrode arrangedbetween the second electrodes adjacent to each other, wherein the firstdummy electrode is formed of a metal fine wire to have a pattern by thefirst detection electrode portion and the dummy pattern portions in thefirst electrode, and the second dummy electrode is formed of a metalfine wire to have a pattern by the second detection electrode portionand the dummy pattern portions in the second electrode.
 5. Theconductive member according to claim 1, wherein the first mesh patternhas a first mesh pitch determined by an average value of distances inthe first direction between centers of gravity of the first mesh cellsadjacent to each other in the first direction, the second mesh patternhas a second mesh pitch determined by an average value of distances inthe first direction between centers of gravity of the second mesh cellsadjacent to each other in the first direction, the metal fine wires ofthe first mesh pattern and the metal fine wires of the second meshpattern are arranged so as to be overlapped with each other in a pointshape, the third mesh pattern has a third mesh pitch determined by anaverage value of distances in the first direction between centers ofgravity of the third mesh cells adjacent to each other in the firstdirection, and the third mesh pitch is ¼ or less of the first mesh pitchand ¼ or less of the second mesh pitch.
 6. The conductive memberaccording to claim 5, wherein the first mesh pattern and the second meshpattern are arranged such that centers of gravity of the first meshcells and peaks of the second mesh cells are at positions different fromeach other.
 7. The conductive member according to claim 5, wherein thefirst mesh pitch and the second mesh pitch are 500 μm or more.
 8. Theconductive member according to claim 5, wherein the first mesh pitch andthe second mesh pitch are identical to each other.
 9. The conductivemember according to claim 1, wherein each of the first mesh cell, thesecond mesh cell, and the third mesh cell has a quadrangular shape. 10.The conductive member according to claim 9, wherein the first meshpattern is constituted by the plurality of first mesh cells having thesame shape, the second mesh pattern is constituted by the plurality ofsecond mesh cells having the same shape, the third mesh pattern isconstituted by the plurality of third mesh cells having the same shape,and the quadrangular shape is a rhombus.
 11. The conductive memberaccording to claim 10, wherein the first mesh cell and the second meshcell have the same shape.
 12. The conductive member according to claim9, wherein a length of a side of the third mesh cell has an irregularvalue of −10% to +10% with respect to an average value of lengths ofsides of the plurality of third mesh cells constituting the third meshpattern.
 13. The conductive member according to claim 1, wherein thefirst mesh pattern has a gap of 150 μm or more between an end portion ofthe metal fine wire forming the dummy pattern portion in the firstelectrode and the metal fine wire forming the first mesh cell, and thesecond mesh pattern has a gap of 150 μm or more between an end portionof the metal fine wire forming the dummy pattern portion in the secondelectrode and the metal fine wire forming the second mesh cell.
 14. Theconductive member according to claim 1, wherein the dummy patternportion in the first electrode and the dummy pattern portion in thesecond electrode do not include metal fine wires intersecting to eachother in a cross shape.
 15. The conductive member according to claim 1,wherein the first mesh pattern has a first mesh pitch determined by anaverage value of distances in the first direction between centers ofgravity of the first mesh cells adjacent to each other in the firstdirection, the second mesh pattern has a second mesh pitch determined byan average value of distances in the first direction between centers ofgravity of the second mesh cells adjacent to each other in the firstdirection, and the first mesh pitch and the second mesh pitch are 500 μmor more.
 16. The conductive member according to claim 15, wherein thefirst mesh pattern has a gap of 150 μm or more between an end portion ofthe metal fine wire forming the dummy pattern portion in the firstelectrode and the metal fine wire forming the first mesh cell, and thesecond mesh pattern has a gap of 150 μm or more between an end portionof the metal fine wire forming the dummy pattern portion in the secondelectrode and the metal fine wire forming the second mesh cell.
 17. Theconductive member according to claim 16, wherein the dummy patternportion in the first electrode and the dummy pattern portion in thesecond electrode do not include metal fine wires intersecting to eachother in a cross shape.
 18. The conductive member according to claim 17,wherein the first mesh pattern and the second mesh pattern are arrangedsuch that centers of gravity of the first mesh cells and peaks of thesecond mesh cells are at positions different from each other, the thirdmesh pattern has a third mesh pitch determined by an average value ofdistances in the first direction between centers of gravity of the thirdmesh cells adjacent to each other in the first direction, and the thirdmesh pitch is ¼ or less of the first mesh pitch and ¼ or less of thesecond mesh pitch.
 19. The conductive member according to claim 18,wherein the first mesh pattern is constituted by the plurality of firstmesh cells having the same shape, the second mesh pattern is constitutedby the plurality of second mesh cells having the same shape, the thirdmesh pattern is constituted by the plurality of third mesh cells havingthe same shape, and the third mesh cell has a rhombus shape.
 20. A touchpanel comprising the conductive member according to claim 1.